Applied Materials, Inc.

Integrated Optics Communications Corporation

Other

Asml Netherlands B.v.

Xunlei Networking Technologies, Ltd.

International Optics Communications Corporation

Oplux, Inc.

Applied Materials, Inc.—robotics

Ming Xu

Peiching Ling

Jinliang Chen

Ashley M Okada

Jianjun Zhang

Kenneth Le

Andrew Nguyen

Kenneth S Collins

James P Cruse

Sushant Suresh Koshti

Michael Robert Rice

Banqiu Wu

Benjamin Schwarz

Wayne Lui

Sanjeev Baluja

Wei Fang

Nir Merry

Joseph F AuBuchon

Martin Jeffrey Salinas

Dermot Cantwell

Imad Yousif

Evans Yip Lee

Corie Lynn Cobb

Marcel E Josephson

Lingling Pu

Kevin M Brashear

Charles Hardy

Zhifeng Sui

Srikanth Krishnamurthy

Wentian Zhou

Teng Wang

Alexander Fernandez

Shenglong Zou

Yu Chen

Jiangjun Zhang

Nan Zhao

Duc Dang Buckius

Jennifer Y Sun

Vijay D Parkhe

Michael D Willwerth

Paul Zachary Wirth

Jared Ahmad Lee

Ezra Robert Gold

Steven E Babayan

Alexander Berger

John William Lane

Mariusch Gregor

Yen-Kun Victor Wang

Abhijit Ashok Kangude

Balarabe Mohammed

Elizabeth Neville

Arun Chakravarthy Chakravarthy

Jeffrey Ludwig

Sohrab Zokaei

Syed A Alam

Arvinder Manmohan Singh Chadha

Ramachandra Murthy Gunturi

Chahal Neema

Alex J Tom

Berrin Daran

Kurt R Langeland

Raechel Chu-Hui Tan

Vishal S Jamakhandi

Aditi Mithun

Certain embodiments of the present disclosure relate to a sensor assembly including a substrate, a housing, and a sensor die. In certain embodiments, the substrate includes an outer region, an inner region, and a middle region between the outer region and the inner region. In certain embodiments, the substrate includes electrical contact pads on at least the inner region. In certain embodiments, the housing is coupled to the substrate at the middle region or the outer region to provide a hermetic seal. In certain embodiments, the sensor die is coupled to the substrate at the inner region via the electrical contact pads. The sensor die is aligned to the substrate via aligning features that align the sensor die relative to the substrate in at least one of a first plane or a second plane.

Packaging for a sensor and methods of manufacturing thereof

A showerhead for a processing chamber includes a faceplate with a plurality of openings. A plurality of compartments are recessed into a top surface of the faceplate. The showerhead includes a plurality of MEMS devices. Each MEMS device is disposed in a corresponding compartment of the plurality of compartments. A printed circuit board including a plurality of ports therethrough is coupled to each MEMS device. Each MEMS device is configured to regulate a gas flow into each corresponding compartment through a corresponding port of the plurality of ports in the printed circuit board.

Integrated showerhead

A flow ratio controller (FRC) valve includes a displacement device configured to control fluid flow through the FRC valve, a displacement sensor coupled to the displacement device, and a processing device. The processing device is to: identify an input signal indicative of a first setpoint to preposition the displacement device for a process of a recipe; commence, based on the input signal, adjustment of physical displacement of the displacement device; determine, based on a feedback signal received from the displacement sensor during the adjustment, whether the physical displacement of the displacement device matches the first setpoint; and responsive to determining that the physical displacement of the displacement device matches the first setpoint, stop the adjustment of the physical displacement of the displacement device.

Piezo position control flow ratio control

Disclosed herein are embodiments of a sensor device, systems incorporating the same, and methods of fabricating the same. In one embodiment, a sensor device comprises a free-standing sensing element, such as a micro-electromechanical system (MEMS) device. The sensor device further comprises a metallic band to facilitate mounting the MEMS device to a mounting plate. The sensor device further comprises a conformal coating on a least a portion of a sensor region of the sensor device.

Micro-electromechanical device for use in a flow control apparatus

A gas distribution apparatus is provided having a first reservoir with a first upstream end and a first downstream end and a second reservoir with a second upstream end and a second downstream end. A reservoir switch valve is in fluid communication with the first downstream end of the first reservoir and the second downstream end of the second reservoir. The reservoir switch valve operable to selectively couple the first reservoir to an outlet of the reservoir switch valve when in a first state, and couple the second reservoir to the outlet of the reservoir switch valve when in a second state. A plurality of proportional flow control valves are provided having inlets coupled in parallel to the outlet of the reservoir switch valve The plurality of proportional flow control valves have outlets configured to provide gas to a processing chamber.

Fast gas exchange apparatus, system, and method

Disclosed herein are embodiments of a sensor assembly, methods of manufacturing the same, and methods of using the same. In one embodiment, a sensor assembly comprises a substrate comprising an outer region, an inner region, and a middle region positioned between the outer region and the inner region, the substrate further comprising electrical contact pads on at least the inner region. The sensor assembly further comprises a housing coupled to the substrate at the outer region or at the middle region to form a hermetic seal. The sensor assembly further comprises a sensor device coupled to the substrate, via the electrical contact pads, at the inner region. In certain embodiments, the sensor assembly further comprises a conformal coating deposited on at least a portion of the sensor assembly.

Packaging design for a flow sensor and methods of manufacturing thereof

A method and system for monitoring and detecting a gas leak in a gas stick assembly is provided. The method includes measuring a pressure in a mass flow controller of the gas stick assembly at different time points and determining whether there is a difference in pressure at the different time points that exceeds a difference threshold.

Leak detection for gas sticks

Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may define a plurality of gas inlets and gas outlets. A number of gas outlets may be greater than a number of gas inlets. The systems may include a plurality of valve blocks that are interfaced with the gas splitter. Each valve block may define a number of gas lumens. An inlet of each of the gas lumens may be in fluid communication with one of the gas outlets. An interface between the gas splitter and each of the valve blocks may include a choke. The systems may include a plurality of output manifolds seated on the lid plate. The systems may include a plurality of output weldments that may couple an outlet of one of the gas lumens with one of the output manifolds.

Gas delivery system for a shared gas delivery architecture

A method includes receiving, for a first pipe, first pressure values corresponding to first valve positions of a first valve coupled to the first pipe. The method further includes receiving, for a second pipe routed in parallel with the first pipe, second pressure values corresponding to second valve positions of a second valve coupled to the second pipe. The method further includes generating a fluid conductance map based on the first valve positions, the first pressure values, the second valve positions, and the second pressure values. The method further includes causing, by a processing device based on a recipe and the fluid conductance map, the first valve to be in a first valve position and the second valve to be in a second valve position for a process of the recipe.

A manufacturing system includes a processing chamber, an gas supply, and a mass flow control apparatus coupled to the gas supply and the processing chamber. The mass flow control apparatus includes a flow restriction element configured to restrict a flow rate of a gas, a bypass flow element configured to control the flow rate of the gas in parallel to the flow restriction element, and a pressure regulator configured to control a pressure of the gas between the pressure regulator and the flow restriction element and/or a pressure of the gas between the pressure regulator and the flow restriction element. The manufacturing system further includes a controller that is configured to flow gas from the gas supply to the processing chamber via the mass flow control apparatus in view of a first pressure setting. The controller further determines to modify the flow of the gas from a first flow rate associated with the first pressure setting to a second flow rate. The controller further determines a second pressure setting associated with the second flow rate and causes the pressure regulator to modify the pressure of the gas between the pressure regulator and the flow restriction element and/or the pressure regulator and the bypass flow element in view of the second pressure setting.

Pressure regulated flow controller

Disclosed herein are embodiments of a mass flow control apparatus, systems incorporating the same, and methods using the same. In one embodiment, a mass flow control apparatus comprises a flow modulating valve configured to modulate gas flow in a gas flow channel, a sensor device, such as a micro-electromechanical (MEMS) device, configured to generate a signal responsive to a condition of the gas flow, and a processing device operatively coupled to the flow modulating valve and the sensor device to control the flow modulating valve based on a signal received from the sensor device.

Mass flow control based on micro-electromechanical devices

Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.

Systems and methods of optimal metrology guidance

Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.

Gas-pulsing-based shared precursor distribution system and methods of use

A diaphragm valve includes an inlet port, an outlet port, and a valve seat proximate one of the inlet port or the outlet port. A diaphragm is positioned relative to the valve seat and has an open state wherein the diaphragm is spaced from the valve seat to enable a fluid path between the inlet port and the outlet port. The diaphragm has a closed state wherein the diaphragm is seated on the valve seat to block the fluid path. A coupling member is coupled between the diaphragm and a reciprocatable member and configured to maintain the diaphragm in the open state while the reciprocatable member is in the opened position. The coupling member may have a clearance gap relative to the reciprocatable member when the reciprocatable member is in the closed position. Other diaphragm valves and methods of operating diaphragm valves are also disclosed.

Diaphragm valves and methods of operating same

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San Jose, CA, United States of America

Ming Xu