United Microelectronics Corp.

Ming-Tung Wang

Ching-Hsing Hsieh

Lian-Hua Shih

Yung-Yu Yang

Chia-Chi Chang

Feng-Chi Chung

Li-Ting Lin

Meng-Chih Chang

Chiu-Ping Chang

A method of monitoring a processing system for processing a substrate is provided. The method includes the following steps: acquiring data from the processing system for a plurality of parameters, the data including a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups including a plurality of correlated parameters; constructing a principle components analysis (PCA) model from the data values for the correlated parameters in a first one of the sub-groups, including normalizing the data values in the first one of the sub-groups with a first weighting factor and a second weighting factor, wherein the first weighting factor is different from the second weighting factor; and determining a statistical quantity using the PCA model.

Method of monitoring processing system for processing substrate

Growing community of inventors

Jiadong, Taiwan

Ming-Tung Wang