Au Optronics Corporation

Quanta Display Inc.

Ming-Hung Shih

Chu-Yu Liu

Meng-Yi Hung

I-Chun Chen

Mao-Tsun Huang

Chou-Chin Wu

Shih-Chin Chen

Hao-Chieh Lee

An active device array substrate including a first patterned conductive layer, a dielectric layer, a second patterned conductive layer, a passivation layer and pixel electrodes is provided. The first patterned conductive layer includes scan lines, common lines, gates and strip floating shielding patterns. The dielectric layer covering the first patterned conductive layer has first contact holes which expose a portion of the common lines, respectively. The second patterned conductive layer includes data lines, sources, drains and strip capacitance electrodes. Each strip capacitance electrode is electrically connected to one of the common lines through one of the first contact holes. A gap is formed between each data line and one strip capacitance electrode, and the strip floating shielding patterns are disposed under the data lines, the gap and the strip capacitance electrodes. Each pixel electrode is electrically connected to one of the drains through one of the second contact holes.

Active device array substrate

A pixel structure having the following structure is provided. A light-shielding layer with a flat layer covering thereon is disposed on a substrate. A channel layer, a data line and a first pad are disposed on the flat layer. A source and a drain partially cover two sides of the channel layer. A gate dielectric layer with a gate, a scan line and a second pad disposed thereon covering the channel layer, the source and the data line exposes the drain and the first pad. A protection layer covering the gate and the scan line exposes the drain, the first and second pads. A patterned transparent conductive layer includes a pixel electrode disposed on the protection layer, a first retain portion disposed on the first pad and a second retain portion disposed on the second pad.

Pixel structure

A pixel structure and a fabrication method thereof are provided. A substrate with a light-shielding layer and a flat layer formed thereon is provided. A first photomask process is conducted to pattern a first metal layer and a semiconductor layer for forming a source, a drain, a channel layer, a data line and a first pad. A second photomask process is conducted to pattern the protection layer, the second metal layer and the gate dielectric layer for forming a gate, a scan line and a second pad, and a part of the drain is exposed. A third photomask process is conducted to pattern a transparent conductive layer for forming a pixel electrode.

Pixel structure and fabricating method thereof

A method for manufacturing a liquid crystal display includes the following steps. First, source/drain and a bottom electrode are formed over a color filter substrate with a color filter layer. The next step forms source/drain junction regions over the source/drain. A channel region is also formed between the source/drain in this step. A gate dielectric layer and a gate are formed over the channel region and the source/drain junction regions in this step as well. Moreover, a plurality of stack layers and an upper electrode are formed over the bottom electrode in this step, too. Then, a pixel electrode is formed to electrically connect one of the source/drain and the bottom electrode. Then, a passivation layer pattern is formed to cover the source/drain, the gate, the upper electrode and the bottom electrode by backside exposure. Finally, a plurality of steps are performed to finish the liquid crystal display.

Manufacturing method for a liquid crystal display

A method of fabricating a pixel structure of liquid crystal display is described. A transparent conductive layer and a first metal layer are formed over a substrate sequentially. The first metal layer and the transparent conductive layer are patterned to form a gate pattern and a pixel electrode pattern. A gate insulating layer and a semiconductor layer are formed over the substrate sequentially. A patterning process is performed to preserve the semiconductor layer and the gate insulating layer above the gate pattern and remove the first metal layer of the pixel electrode pattern. A second metal layer is formed over the substrate. The second metal layer is patterned to form a source pattern and a drain pattern. A black material layer is formed over the substrate, and then the black material layer is patterned to form a black matrix pattern uncovering the transparent conductive layer of the pixel electrode pattern.

Pixel structure of an LCD and fabricating method including performing a third photomask process for reducing the thickness of the semiconductor layer between the source and drain patterns

A liquid crystal display (LCD) panel including a thin film transistor (TFT) array substrate, a color filter substrate, a sealant, and a liquid crystal layer is provided. The TFT array substrate includes a substrate, a plurality of pixel structures, a plurality of scan lines, a plurality of data lines, and a light-shielding pattern. The scan lines and data lines are disposed on the substrate for controlling the operation of the pixel structures. The light-shielding pattern arranged on the periphery of the panel traverses the scan lines and data lines and is electrically insulated from the scan lines and data lines. The sealant is sandwiched between the TFT array substrate and the color filter substrate and is corresponding to the light-shielding pattern. The liquid crystal layer is disposed between the TFT array substrate, the color filter substrate, and the sealant.

Liquid crystal display panel

A method for fabricating a pixel array substrate is provided. The method includes: forming a plurality of gate electrodes, a plurality of scan lines, a plurality of data line patterns and a plurality of pixel electrode patterns on a substrate; then forming a channel over each of the gate electrodes and a plurality of contact window openings for exposing the data line patterns; then forming a plurality of contact windows electrically connected with the data line patterns; and then forming a plurality of contacting portions which are electrically connected with the contact windows, a plurality of source electrodes which are electrically connected with the data line patterns, and a plurality of drain electrodes which are electrically connected with the pixel electrodes. The data line patterns at each column are electrically connecting with each other via the contacting portions and the contact windows so as to form a data line.

Method for fabricating pixel array substrate

Pixel structure of a liquid crystal display and fabricating method with black matrix pattern covering over TFT and directly lying on parts of pixel electrode pattern

A method of fabricating a pixel structure is disclosed. A substrate having a color filter layer thereon and a leveling layer further covers the color filter layer is provided. A first metal layer is formed over the leveling layer. The first metal layer is patterned to define a source/drain. A channel material layer, a gate insulating layer and a second metal layer are formed over the substrate to cover the source/drain. The second metal layer, the gate insulating layer and the channel material layer are patterned to define a gate and a channel layer. A passivation layer is formed over the substrate to cover the gate. The passivation layer is patterned to expose a portion of the drain. A transparent conductive layer is formed over the substrate, and is electrically connected to the exposed drain. Thereafter, the transparent conductive layer is patterned to form a pixel electrode.

Fabricating method of a pixel structure

Pixel structure, and thin film transistor

A method of fabricating a pixel structure of TFT LCD is provided. First, a gate pattern, pixel electrode pattern, gate isolating layer and semiconductor layer are formed over the substrate sequentially. Then, a patterning process is performed to remove the first metal layer over the pixel electrode pattern, wherein the gate isolating layer and semiconductor layer are retained over the gate pattern. Next, a source pattern and drain pattern are sequentially formed over the substrate, and then a passivation layer and photoresist layer are formed over the substrate. Thereafter, a back side exposure process and a patterning process are performed by using the gate pattern, source pattern and drain pattern as mask to pattern the photoresist layer. Thereafter, the passivation layer is etched by using the patterned photoresist layer as mask to expose the transparent conductive layer of the pixel electrode pattern. Finally, the photoresist layer is removed.

Growing community of inventors

Taoyuan, Taiwan

Ming-Hung Shih