Macronix International Co., Ltd.

Ming-Da Cheng

Kuang-Chao Chen

Tuung Luoh

Chin-Ta Su

Ta-Hung Yang

Chin-Tsan Yeh

A method of forming an isolation structure, comprising: (a) providing a base having a recess; (b) forming a stop layer on the base and in the recess; (c) forming a dielectric material on the stop layer so as to allow the rest of the recess to be filled with the dielectric material; (d) removing the dielectric material over the base by performing a chemical mechanical polishing (CMP) process until a part of the stop layer is exposed so as to form a dielectric layer in the recess; and (e) removing a part of the stop layer, wherein the another part of the stop layer and the dielectric layer filled in the recess constitute the isolation structure.

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Tonfene, Taiwan

Ming-Da Cheng