Taiwan Semiconductor Manufacturing Comp. Ltd.

Ming Chih Wang

Chih-Hsien Hsu

Yu-Pei Chiang

Jr-Sheng Chen

Chun Yan Chen

Shih-Che Huang

Zhi-Hao Huang

An-Chi Li

Devices and methods for controlling wafer uniformity in plasma-based process is disclosed. In one example, a device for plasma-based processes is disclosed. The device includes: a housing defining a process chamber and a gas distribution plate (GDP) arranged in the process chamber. The housing comprises: a gas inlet configured to receive a process gas, and a gas outlet configured to expel processed gas. The GDP is configured to distribute the process gas within the process chamber. The GDP has a plurality of holes evenly distributed thereon. The GDP comprises a first zone and a second zone. The first zone is closer to the gas outlet than the second zone. At least one hole in the first zone is closed.

Devices and methods for controlling wafer uniformity in plasma-based process

Pressurized oil mist receiving device

Growing community of inventors

Hsin-Chu, Taiwan

Ming Chih Wang