Samsung Electronics Co., Ltd.

Minchang Ko

Hangu Kim

Jaehyok Ko

ChangSu Kim

Kyoungki Jeon

Sungpil Jang

Dongryul Chang

An electrostatic discharge protection device includes: a substrate of a second conductivity type, the substrate including a well of a first conductivity type; a cathode electrode connected to the substrate; a first diffusion region of the second conductivity type and a second diffusion region of the first conductivity type, formed in the substrate and connected to the cathode electrode; an anode electrode connected to the substrate; a third diffusion region of the second conductivity type and a fourth diffusion region of the first conductivity type, formed in the well and connected to the anode electrode; a fifth diffusion region of the first conductivity type, formed on a border of the substrate and the well; and a sixth diffusion region of the first conductivity type, formed in the substrate between the first and second diffusion regions and the fifth diffusion region and configured to receive a bias voltage from outside.

Electrostatic discharge protection device capable of adjusting holding voltage

A semiconductor device includes a first driver configured to pull up a voltage level of a pad to a first power voltage in response to a driving signal, a second driver configured to pull down the voltage level of the pad to a second power voltage in response to the driving signal, a switch protection resistor configured to change an electrical resistance between the pad and the second driver in response to a switch control signal, and an ESD detector configured to detect a voltage level of the first or second power voltage and generate the switch control signal.

Semiconductor device including electrostatic discharge circuit and operation method thereof

An electrostatic discharge protection device may include a first conductivity type well, a second conductivity well; a first doping region and a second doping region which are formed in the first conductivity type well and have different conductivity types from each other; a third doping region and a fourth doping region which are formed in the second conductivity type well and have different conductivity types from each other; and a fifth doping region formed in the second conductivity type well between the first and second doping regions and the third and fourth doping regions.

Electrostatic discharge protection device

A diode includes a first region having a first conductive type impurity and formed in a first well having the first conductive type impurity, a second region formed in the first well and having a second conductive type impurity, and a semiconductor pattern disposed above the first well and including a first portion having the first conductive type impurity and a second portion having the second conductive type impurity. The first region and the first portion are coupled with an anode, and the second region and the second portion are coupled with a cathode.

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Hwaseong-si, South Korea

Minchang Ko