Panasonic Intellectual Property Management Co., Ltd.

Panasonic Holdings Corporation

Minato Seno

Hiroyuki Yamada

Ayumu Yano

Shin Nanba

A solar cell includes: a crystalline semiconductor substrate of a first conductivity type; a first semiconductor layer provided on a first region on one principal surface of the substrate; a second semiconductor layer provided on a second region on the one principal surface different from the first region; a first transparent electrode layer provided on the first semiconductor layer; and a second transparent electrode layer provided on the second semiconductor layer. The first semiconductor layer includes a first amorphous semiconductor layer of the first conductivity type and a first crystalline semiconductor part extending from the one principal surface toward the first transparent electrode layer. The second semiconductor layer includes a second amorphous semiconductor layer of a second conductivity type different from the first conductivity type.

Solar cell and method of manufacturing solar cell

A solar cell includes: a silicon substrate including a texture structure in a first principal surface; and a first non-crystalline silicon layer formed on the first principal surface of the silicon substrate and including recesses and protrusions reflecting the texture structure. At a valley portion in the recesses and protrusions, the first non-crystalline silicon layer includes, in the stated order: a first epitaxial layer including a crystalline region epitaxially grown on the silicon substrate; a first amorphous layer which is a non-crystalline silicon layer; and a second amorphous layer which is a non-crystalline silicon layer. The density of the first amorphous layer is less than the density of the second amorphous layer.

Solar cell, solar cell module, and method for manufacturing solar cell

In one or more embodiments, a solar cell may include: a silicon substrate, which is crystalline; a p-doped silicon oxide layer, which may be disposed on a first principal surface of the silicon substrate and may include phosphorus as an impurity; and an amorphous silicon layer, which may be disposed on the p-doped silicon oxide layer.

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Osaka, Japan

Minato Seno