Lg Chem, Ltd

Min-Young Lim

Dae-Hyun Kim

Heon Kim

Sung-Ho Chun

Han-Soo Kim

Sung-Hyun Kim

Raisa Kharbash

Kyung-Jun Kim

Ji-Heum Yoo

Yoon-Hee Heo

Kyung-Soo Choi

Keon-Woo Lee

Chang-Ho Cho

Geun-Young Cha

Ho-Chan Ji

Dong-Chang Choi

Jae-Joon Kim

Mi-Ae Kim

Dong-Kung Oh

Sang-Kyu Kwak

Kwang-Han Park

Hee-Kwan Park

Il-Eok Kwon

Jong-Hyun Park

Xiang-Li Li

A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin. Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.

Colored dispersion, photoresist composition and black matrix

The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.

Polymer resin compounds and photoresist composition including new polymer resin compounds

The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.

Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin

The present invention relates to a fluorene-based resin polymer having a repeating unit of Formula 1 and a method for preparing the same. The fluorene-based resin polymer has a high molecular weight and low acid value, and has an excellent developing property, adhesive property, and stability.

Fluorene-based resin polymer and method for preparing thereof

The present invention relates to a composition for preparing a curable resin, comprising a) a compound represented by Formula 1; b) glycidyl (meth)acrylate; c) acid monoanhydride; and d) a solvent, a curable resin manufactured by the composition, and an ink composition comprising the same. The curable resin has a low viscosity and excellent flow properties, and the ink composition is excellent in terms of storage stability, heat resistance and chemical resistance.

Composition for manufacturing indurative resin, indurative resin manufactured by the composition and ink composition comprising the resin

The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin, and a device that is manufactured by using the photosensitive composition. In the case of when the alkali-developable resin is used as a component of the photosensitive composition, the photosensitivity, the developability and the film remaining rate of the pattern are improved.

Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins

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Sungnam-si, South Korea

Min-Young Lim