Lg Chem, Ltd

Lf Chem, Ltd.

Min Young Lim

Sung Hyun Kim

Han Soo Kim

Ji Hye Kim

Heon Kim

Sung-Ho Chun

Keon Woo Lee

Hye Won Jeong

Sung Joon Oh

Sung Ho Chun

Byung Hyun Lee

Tae Seob Lee

Yoon Hee Heo

Sun Hwa Kim

Kyungjun Kim

Kyung Jun Kim

Dae Hyun Kim

Ji Heum Yoo

Jeong Ae Yoon

Chang Ho Cho

Ho Chan Ji

Geun Young Cha

Yongmi Kim

Dong Myung Shin

Dong Chang Choi

Ji Su Kim

Jungho Jo

Xiang Li Li

Jung Ho Jo

Mi Kyung Kim

Sung-Hyun Kim

Jong Hyun Park

Raisa Kharbash

Min A Yu

Kyung-Jun Kim

Mi Kyoung Kim

Dong Kung Oh

Kwang Han Park

Eun Seok Park

Kyung Soo Choi

Hyun Min Park

Jae Joon Kim

Il Eok Kwon

JinWoo Cho

Jin Woo Cho

Hee Kwan Park

The present invention relates to a photoresist composition capable of realizing excellent pattern performance during formation of fine patterns, and of preparing a photoresist film that is excellent in chemical stability of a plating solution, and a photoresist film using the same.

Photoresist composition and photoresist film using the same

The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.

Positive-working photoresist composition, pattern produced therefrom, and method for producing pattern

A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.

Chemically amplified photoresist composition and photoresist film using the same

A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.

Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same

The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.

Chemically amplified photoresist composition, photoresist pattern, and method for preparing photoresist pattern

The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.

Positive photoresist composition, photoresist pattern using the same, and manufacturing method of the photoresist pattern

The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1:  In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.

Multi function photoacid generator and chemically amplified photoresist composition for thick layer comprising the same

An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder resin. The use of the alkali-soluble resin lowers the overall viscosity of the photosensitive resin composition to effectively reduce the height of a stepped portion of a photoresist pattern using a small amount of the photosensitive resin composition.

Alkali-soluble resin and negative-type photosensitive resin composition comprising the same

Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.

Photoreactive polymer and process of making the same

Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.

Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same

An ink composition for roll printing is provided. The ink composition uses a solvent system having an evaporation rate (V) of at least 0.1 mg/cm&#xb7;min and an absorption rate (S) into a blanket of less than 3.412 mg/cm&#xb7;min. The use of the highly volatile solvent system can minimize swelling of the blanket without impairing the dispersibility of a pigment in the ink composition. Therefore, the uniformity of a pattern formed using the ink composition can be maintained and the formation of defects by the solvent system can be minimized.

Ink composition for roll printing

Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.

Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition

Disclosed is a multifunctional urethane monomer prepared by reacting (a) an epoxy compound having two or more epoxy groups, (b) a diol compound having an acidic group and (c) a compound having an ethylenically unsaturated group and an isocyanate group with one another. The photosensitive resin composition comprising the multifunctional urethane monomer has low viscosity, superior sensitivity, excellent chemical resistance and heat-resistance and high development margin.

Multifunction urethane monomer, method of manufacturing the monomer and photosensitive resin composition including the monomer

A heat-curable ink composition and a color filter produced using the ink composition are provided. The ink composition and the color filter are highly resistant to heat and chemicals due to the use of a polyester resin prepared by polycondensation. In addition, unreacted anhydride groups are removed using a monohydric alcohol in the preparation of the ink composition to make the ink composition and the color filter very stable during storage.

Ink composition for color filter and color filter

Growing community of inventors

Daejeon, South Korea

Min Young Lim