Samsung Electronics Co., Ltd.

Elemental Scientific, Inc.

Min-Soo Suh

Daniel R Wiederin

Jaeyoung Kim

Sooyeon Kim

Ki-Hyun Kim

So Young Kim

Austin Schultz

Kyle W Uhlmeyer

David Diaz

Jung-Dae Park

Kwang-Shin Lim

Hyun-Young Park

Myung Hwan Kim

Daesung Kim

Junghee Shin

Suyeon Jeong

Systems and methods for analyzing ultra-low level concentration nanoparticles in semiconductor cleaning chemicals by single particle inductively coupled plasma mass spectrometry (spICP-MS) are described. In aspects, the methods described herein include determination factors that are specific to each of the chemical matrix and the type of analyte associated with the nanoparticles present in a fluid sample for both a particle baseline intensity value and a nanoparticle detection threshold.

Nanoparticle analysis for ultra-low level concentrations of nanoparticles in fluid samples

An evaluation system of block copolymer patterns includes a supplier, a plurality of analyzers, and a homopolymer interference remover. The supplier provides a sample including a block copolymer and a homopolymer. The analyzers measure a molecular weight of the block copolymer in the sample, measure a preliminary block ratio, the preliminary block ratio corresponding to a total ratio in the sample of each block in the block copolymer, and selectively measure a ratio of the homopolymer in the sample. The homopolymer interference remover subtracts the ratio of the homopolymer from the preliminary block ratio.

Evaluation systems of block copolymer patterns

Growing community of inventors

Hwaseong-si, South Korea

Min-Soo Suh