Daewoo Electronics Co., Ltd.

Min-Sik Um

Myung-Kwon Koo

Yong-Ki Min

Myung-Hyun Park

An inventive method for the manufacture of an array of M.times.N thin film actuated mirrors for use in an optical projection system includes the steps of: providing an active matrix; depositing a thin film sacrificial layer; depositing a protective oxidation layer on top of the thin film sacrificial layer; creating an array of empty cavities; depositing an elastic layer; forming an array of conduits in the elastic layer; depositing a second thin film, a thin film electrodisplacive and a first thin film layers, successively, thereby forming a multiple layer structure; patterning the multiple layer structure, until the thin film sacrificial layer is exposed; and removing the thin film sacrificial layer to thereby form an array of M.times.N thin film actuated mirrors. The protective oxidation layer is deposited on top of the thin film sacrificial layer before the formation of each of the empty cavities, which, in turn, prevents phosphorus on the surface of thin film sacrificial layer from getting oxidized.

Method for the manufacture of a thin film actuated mirror array

A method for electrically connecting a thin film electrode to a connecting terminal on an active matrix in the manufacture of a thin film actuated mirror is disclosed. The method includes the steps of: forming a thin film sacrificial layer having an empty cavity on top of the active matrix; forming an elastic, a second thin film and a thin film electrodisplacive layers, successively, on top of the thin film sacrificial layer including the empty cavity; forming a contact hole extending from top of the thin film electrodisplacive layer to top of the connecting terminal; forming a first thin film layer on top of the thin film electrodisplacive layer including the contact hole; patterning the first thin film, the thin film electrodisplacive, the second thin film and the elastic layers, respectively; and removing the thin film sacrificial layer, thereby forming the thin film actuated mirror.

Method for forming an electrical connection in a thin film actuated

A method for forming an elastic member in a thin film actuated mirror, the method being capable of controlling a stress built up therein, is disclosed. The method includes the steps of: forming a thin film sacrificial layer; depositing an elastic layer on top of the thin film sacrificial layer by using a CVD method; forming an actuating structure on top of the elastic layer, the actuating structure having a first thin film electrode, a thin film electrodisplacive member, a second thin film electrode and an elastic member; and removing the thin film sacrificial layer. In the present invention, the elastic layer is vertically divided into at least two portions, each of the portions being made of a same material having a different stoichiometry. The stress built up in the elastic layer is controlled by controlling the ratio of the source gases.

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Seoul, South Korea

Min-Sik Um