Samsung Electronics Co., Ltd.

Min-kyung Bae

Tae-hun Kim

Kohji Kanamori

Yong-Seok Kim

Jae-Hoon Jang

Kwang-soo Kim

Bong-Yong Lee

Myung-Hun Woo

A semiconductor device includes a plurality of channel structures on a substrate, each channel structure extending in a first direction perpendicular to the substrate, a common source extension structure including a first semiconductor layer having an n-type conductivity and a gate insulating layer between the substrate and the channel structures, a plurality of gate electrodes on the common source extension structure and spaced apart from each other on a sidewall of each of the channel structures in the first direction, and a common source region on the substrate in contact with the common source extension structure and including a second semiconductor layer having an n-type conductivity. An upper portion of the common source extension structure has a first width, and a lower portion of the common source extension structure has a second width smaller than the first width.

Semiconductor device including vertical channel layer

A vertical semiconductor device includes a plurality of channel connection patterns, a lower insulation layer, a supporting layer, a stacked structure, and a channel structure. The channel connection patterns, on which the lower insulation layer is formed, contact a substrate. The supporting layer is formed on the lower insulation layer to be spaced apart from the channel connection patterns, and includes polysilicon doped with impurities. The stacked structure is formed on the supporting layer, and includes insulation layers and gate electrodes to form a memory cell string. The channel structure passes through the stacked structure, the supporting layer and the lower insulation layer, and includes a charge storage structure and a channel which contacts the channel connection patterns. The charge storage structure and the channel face the gate electrodes and the supporting layer. The supporting layer serves as a gate of a gate induced drain leakage (GIDL) transistor.

Vertical semiconductor devices

A semiconductor device includes a plurality of channel structures on a substrate, each channel structure extending in a first direction perpendicular to the substrate, and having a gate insulating layer and a channel layer, a common source extension region including a first semiconductor layer having an n-type conductivity between the substrate and the channel structures, a plurality of gate electrodes on the common source extension region and spaced apart from each other on a sidewall of each of the channel structures in the first direction, and a common source region on the substrate in contact with the common source extension region and including a second semiconductor layer having an n-type conductivity, wherein the gate insulating layer of each of the channel structures extends to cover an upper surface and at least a portion of a bottom surface of the common source extension region.

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Hwaseong-si, South Korea

Min-kyung Bae