Samsung Electronics Co., Ltd.

Min-Ho Rim

Yu-sin Yang

Chung-sam Jun

Sang-kil Lee

Jung-Soo Kim

Hyung-Suk Cho

Young-hoon Sohn

Yun-jung Jee

Yong-Deok Jeong

An optical measuring method includes generating a Bessel beam, filtering the Bessel beam to generate a focused Bessel beam, vertically irradiating the focused Bessel beam onto a substrate in which an opening is formed, and detecting light reflected from the substrate to obtain an image of a bottom surface of the opening.

Optical measuring method and apparatus, and method of manufacturing semiconductor device using the same

In a method of detecting a defect of a substrate, a first light having a first intensity may be irradiated to a first region of the substrate through a first aperture. A defect in the first region may be detected using a first reflected light from the first region. A second light having a second intensity may be irradiated to a second region of the substrate through a second aperture. A defect in the second region may be detected using a second reflected light from the second region. Thus, the defects by the regions of the substrate may be accurately detected.

Method of detecting a defect of a substrate and apparatus for performing the same

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Hwaseong-si, South Korea

Min-Ho Rim