Sk Innovation Co., Ltd.

Sk Global Chemical Co., Ltd.

Min Ho Jung

Jin Su Ham

Yu Na Shim

Soo Young Hwang

Kyun Phyo Lee

Hye Ryoung Lee

Kwang Kuk Lee

Sun Joo Kim

Jeong Eop Choi

Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition

Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below: 

Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition

Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, Rto R, L, and R' and R&#x2033; are the same as those in the detailed description of the present invention.

Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition

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Daejeon, South Korea

Min Ho Jung