Taiwan Semiconductor Manufacturing Comp. Ltd.

Min-Cheng Chung

Yi-Ming Lin

Chih-Lung Cheng

Po-Chih Huang

Sheng-chun Yang

Chen-Hao Liao

A system and method for generating a gas curtain over an access port of a processing chamber for a semiconductor substrate. A gas flow stabilizer and a gas flow receiver, each including a horizontal flow section and a vertical flow section cooperate to generate a gas curtain that impedes gas, e.g., oxygen, from outside the processing chamber, from flowing into the chamber, for example, when the access port is opened to add/or to remove a workpiece from the processing chamber.

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Hsinchu, Taiwan

Min-Cheng Chung