Cadence Design Systems, Inc.

Min Cao

Roland Ruehl

Jeffrey Markham

Jeffrey Scott Salowe

Henry K Yu

Karun Sharma

Gilles S C Lamant

Eitan Cadouri

Mathew Koshy

Tianhao Zhang

Li-Ling Ma

Some aspects enable users to interactively define a region in an electronic design, identify or generate a track pattern, and assign the track pattern to the region for subsequent physical implementation for the region. Another aspect interactively represents various results on a display apparatus using one or more distinguishing representation schemes. Another aspect is directed at interactive editing a component of an electronic design having track patterns by iteratively modifying a set of track patterns to reach a reduced set of track patterns and by automatically snapping the component to active track(s) in the reduced set for the physical implementation.

Methods, systems, and articles of manufacture for interactively implementing physical electronic designs with track patterns

Disclosed are a method, apparatus, and computer program product for performing interactive layout editing to address double patterning approaches to implement lithography of electronic designs. A spatial query is performed around the shape(s) being created during editing with the distance of allowed spacing in a single mask. If a design error is encountered, corrective editing may occur to correct the error. Checking may occur to make sure that the error detection and corrective actions can be performed interactively.

Method, system, and program product for interactive checking for double pattern lithography violations

A hierarchical schematic design editor displays mask layers for each shape as mask specific colors and alerts a user to mask layer conflicts during the design and editing process. According to an embodiment, mask colors may be assigned at the time the shapes or geometries and cells are placed in a circuit design layout, or when a mask layer condition indicating that two or more shapes should be set to different mask layers is detected. In an embodiment, if the distance between two shapes is less than a predetermined threshold, those shapes may cause a mask layer condition. Shapes may be grouped to facilitate mask layer condition detection and mask layer assignment.

Dual-pattern coloring technique for mask design

Various embodiments provide a constraint-driven environment to interactively determine coloring of layout components when the layout components are being modified or created and to provide feedback with visual aids to users in nearly real-time. Layout components are thus appropriately assigned to respective mask designs upon their creation. Various embodiments check or verify various constraints during creation or modification of layout components, and the layout thus remains design rule clean as constructed. Some embodiments use data structure(s) including information associated with mask identifications of objects of a cluster to change some mask identifications without considering any of the constraints governing these mask identifications. Some embodiments further determine the mask identification for an object based at least in part on whether object splitting and stitching is permitted.

Methods, systems, and computer program products for implementing interactive coloring of physical design components in a physical electronic design with multiple-patterning techniques awareness

Disclosed are method(s), system(s), and article(s) of manufacture for implementing a layout of an electronic circuit using one or more constraint checking windows. The method identifies some constraints on multiple-patterning lithography and multiple constraint checking windows for the layout. The method determines one or more metrics for a constraint checking window or for a layout and assigns one or more shapes in the one or more constraint checking windows to their respective mask designs based on the one or more metrics. The method traverses through the one or more constraint checking windows until all shapes in the layout are assigned to their respective mask designs. The method may also determine a processing order for the one or more constraint checking windows based on the distribution of a type of shapes in the layout.

Methods, systems, and articles of manufacture for implementing constraint checking windows for an electronic design for multiple-patterning lithography processes

A method for automatically generating and prioritizing several design solutions that resolve a double patterning (DP) loop violation in an IC design layout. The method of some embodiments receives a DP loop violation marker and identifies pairs of edges of shapes that form a double patterning loop based on the DP loop violation marker. For each pair of edges that violates the design rule, the method generates one or more design solutions. Each design solution moves a single edge or both edges to resolve the violation. The method of some embodiments computes the cost of applying each design solution to the IC design layout and prioritizes the generated solutions for all the identified pairs of edges based on the computed cost for each solution. The method in some embodiments then selects a solution from the prioritized solutions and applies the selected solution to the design layout.

Method and apparatus for automatically fixing double patterning loop violations

Disclosed is a method and system for processing the tasks performed by an IC layout processing tool in parallel. In some approaches, the IC layout is divided into a plurality of layout portions and one or more of the layout portions are processed in parallel, where geometric select operations are performed in which data for different layout portions may be shared between different processing entities. One approach includes the following actions: select phase one operation for performing initial select actions within layout portions; distributed regioning action for local regioning; distributed regioning action for global regioning and binary select; count select aggregation for count-based select operations; and select phase two operations for combining results of selecting of internal shapes and interface shapes.

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San Ramon, CA, United States of America

Min Cao