Advanced Energy Industries, Inc.

General Electric Company

Lockheed Missiles & Space Company, Inc.

Milan Zarko Ilic

Kalyan N C Siddabattula

Laszlo Laskai

Robert Brian Huff

Vladislav V Shilo

Robert Louis Steigerwald

Andrey B Malinin

Bryce L Hesterman

George W McDonough

Warren R Germer

Richard A Balch

David J Christie

Vinod John

Frank Jakob John Mueller

Darren File

Gerald C Roop, Jr

Robert Huff

Kalyan NC Siddabattula

George Mcdonough

A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.

Over-voltage protection during arc recovery for plasma-chamber power supplies

An apparatus and method for controlling an application of power to power a plasma chamber. A detector detects actual power out from the power stage to the plasma chamber during a sampling interval. A compare module compares the actual power out during the sampling interval to a present power setting during the sampling interval and generates a compensation value. An adjust module updates the present power setting for the power stage with the compensation value to provide a new power setting for the power stage to control the power out from power stage to the plasma chamber during the deposition process whereby power losses occurring during the deposition process are compensated during the deposition process. If there is a fixed time period for the deposition process, the compensation method and apparatus may be used to compensate the deposition process for energy losses without extending the duration of the deposition process.

Delivered energy compensation during plasma processing

Arc recovery with over-voltage protection for plasma-chamber power supplies

A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.

Method and system for controlling a vapor deposition process

A system and method for over-voltage protection is described. In one embodiment of the invention, an apparatus includes an output port configured to deliver power to a plasma chamber to ignite a plasma. The apparatus also includes a shunt switch in parallel with the output port and a processor configured to receive an indicator of an arc in the plasma. The processor is configured to close the shunt switch for a period of time to divert current away from the arc. The processor is also configured to trigger a pulse of the shunt switch to limit a voltage of an increasing voltage condition associated with the arc.

Arc recovery without over-voltage for plasma chamber power supplies using a shunt switch

An interleaved soft switching bridge power converter comprises switching poles operated in an interleaved manner so as to substantially reduce turn-on switching losses and diode reverse-recovery losses in the switching pole elements. Switching poles are arranged into bridge circuits that are operated so as to provide a desired voltage, current and/or power waveform to a load. By reducing switching turn on and diode reverse recovery losses, soft switching power converters of the invention may operate efficiently at higher switching frequencies. Soft switching power converters of the invention are well suited to high power and high voltage applications such as plasma processing, active rectifiers, distributed generation, motor drive inverters and class D power amplifiers.

Interleaved soft switching bridge power converter

Disclosed herein are an apparatus and method for charge-mode control. An embodiment of a charge mode controller may include an analog/digital converter configured to monitor the current through a duty cycle switch and convert the current to a switch current value; an accumulator module configured to integrate the switch current value during the switching cycle and output an accumulated charge value; and a comparator module responsive to the accumulated charge value and a charge set point configured to generate a gate drive signal for the duty cycle switch that turns the duty cycle switch ON when the accumulated charge value is less than the charge set point and turns the duty cycle switch OFF when the accumulated charge value reaches the charge set point and thereby controls the duty cycle of the converter and the power supplied by the power stage.

Digital charge-mode control of a power supply

Method and system for conditioning a vapor deposition target

There is provided by this invention an apparatus and method for controlling a dc magnetron plasma processing system that automatically adjusts the control signal to the power supply based upon the dynamic impedance of the load to control the output power to the plasma. The output voltage and the output current of the power supply that supplies power to the plasma is sampled over at a sampling frequency at least four to five times higher than the switching frequency and the dynamic impedance of the plasma is calculated based upon the sampled voltage and current from the algorithm wherein &#x394;Vand &#x394;Iis the maximum difference among samples on one switching cycle. If the dynamic impedance seen is negative in nature then the control signal is compensated accordingly.

DC power supply utilizing real time estimation of dynamic impedance

There is provided by this invention an apparatus and method of supplying to ignite a plasma wherein in the event of an arc a shunt switch is used to divert the power away from the plasma that is incorporated into an over-voltage protection circuit that controls the shunt switch to act as a boost switch when the arc is extinguished such that the stored inductor energy is used to boost the ignition voltage for reigniting the plasma if it is extinguished. When the arc is extinguished, the inductor current is diminished, and the plasma is ignited, then the switch Sis turned OFF and the inductor energy goes to the plasma and the power supply operates in its normal operating mode.

DC-DC converter with over-voltage protection circuit

There is provided by this invention soft switching interleaved power converters that are suitable for high power and high voltage applications such as plasma processing. They have greatly reduced switching losses and diode reverse-recovery losses which allows operation at high switching frequencies. The peak values of the reverse-recovery currents of the diodes are substantially less then their peak forward operating currents. The power converters incorporate power converter cells that comprise a plurality of switching assemblies that are operated with an interleaved switching pattern, and that are each connected to an input terminal of an inductor assembly that also has a common terminal. The inductance between each pair of input terminals is less than the inductance between each input terminal and the common terminal of the inductor assembly.

Soft switching interleaved power converter

There is provided by this invention a novel apparatus and method of operating a dc plasma process that diverts the power supply current from the plasma at the initiation of an arc, thereby inhibiting energy from flowing from the power supply to the plasma, and then to allow energy to flow again when the power supply re-enables energy flow to the plasma. The diverting means is connected to the output of the power supply to divert current away from the plasma at the initiation of an arc wherein the diverting means is actuated when the arc is detected on the output and diverts the current for a first pre-determined time. The diverting means is released at the end of the first pre-determined time before the current reaches zero wherein current is redirected to the plasma and the diverting means is reactivated at the end of a second pre-determined time in the event the arc is not extinguished.

Apparatus and method for fast arc extinction with early shunting of arc current in plasma

A high power factor converter system comprises an input rectifier, a converter and a booster circuit. The input rectifier is configured for rectifying an input ac voltage. The converter is configured for generating an output voltage for the high power factor converter system. The converter comprises several converter switches and inverse parallel diodes. The booster circuit comprises an inductor and at least one converter switch and an inverse parallel diode of the converter. The inductor is coupled between the input rectifier and the converter. The booster circuit is configured for controlling the supply of a booster current through the inductor to be discontinuous when the instantaneous voltage level is less than a predetermined fraction of a dc voltage level across the converter and continuous when the instantaneous voltage level is greater than the predetermined fraction of the dc voltage level.

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Clifton Park, NY, United States of America

Milan Zarko Ilic