E.i. Dupont De Nemours and Company

Revlon Consumer Products Corporation

E. I. Du Pont Nemours and Co.

Milan Bohuslav Bednarek

Waifong Liew Anton

Loretta Ann Grezzo Page

Soodabeh Tronson

Sheau-Hwa Ma

Keshava A Prasad

Harry J Spinelli

Robert P Held

Zeying Ma

Julio Gans Russ

Christopher Scopazzi

Edward George Howard, Jr

Robert W Sandewicz

Joseph Frank Calello

Kathryn A Pearlstine

Natividad R Jose

Anjali Abhimanyu Patil

Arthur C Shor

Joseph E Reardon

Ann Marshall Ureneck

Soodebeh Tronson

Colored and clear nail polish compositions comprise a solvent system having no more than 30 weight % water, a film forming acrylic binder prepared from (meth)acrylic monomers and stirene and which further contain specific adhesion promoting monomers or monomer combinations selected from (1) anhydride, anhydride plus acid, anhydride plus ureido, anhydride plus beta-diketone; (2) acid plus hydroxy; and (3) ureido, ureido plus acid, or ureido plus beta-diketone have properties equal to or better than commercially available nail polish compositions and permit the formulation of all acrylic pigmented nail polish compositions.

Nail polish compositions containing acrylic polymers

A color cosmetic composition comprising an oil component and a particulate matter component, the improvement wherein the composition additionally contains an uncrosslinked synthetic polymer having a glass transition temperature of -10 to 75.degree. C., comprising at least one methacrylate ester monomer repeat unit which, if polymerized, would yield a polymer having a glass transition temperature of -10 to 75.degree. C.

Cosmetic compositions

Inks for ink jet printers containing an aqueous carrier medium; a pigment; a polymeric dispersant; and an emulsion polymer additive stabilized with a structured polymer are stable, have low viscosity, exhibit excellent print quality, provide excellent smear resistance after drying, have good decap and crusting time, and also demonstrate good charging stability when used in continuous flow printers.

Ink jet inks containing emulsion polymer additives stabilized with

An ink for ink jet printers contains an aqueous carrier medium; a colorant that is insoluble in the aqueous carrier; a branched polymer dispersant; and an emulsion polymer additive and is stable, has low viscosity, exhibits excellent print quality, provides excellent smear resistance after drying and has good decap or crusting time.

Ink jet inks containing branched polymer dispersants and emulsion

Water-fastness of inks containing pigment and a polymeric dispersant is improved by the addition of core-shell or tetrafluoroethylene emulsion polymers. The printed ink images exhibit improved resistance to smudge or smear when handled or marked with highlight pens.

Ink jet inks containing emulsion-polymer additives to improve

Bleed between two adjacent pigmented inks on a printing medium is reduced. The first ink has at least one neutralized carboxylic acid group, neutralized amine, or a quaternized amine group; and the second ink contains a polymeric dispersant having at least one sulfonate or phosphonate group, and a carboxylic acid additive having a pKa of up to 3.5.

Pigmented ink set and process for alleviating bleed in printed elements

A graft polymer having (a) a hydrophilic backbone prepared from unneutralized acid containing monomers wherein the acid has a pKa of at least 3, and wherein the backbone is completely soluble in water and insoluble in non-polar organic solvents; and (b) at least one discrete hydrophobic side chain, wherein 20 to 100% of the side chains are prepared from non-polar aliphatic or aromatic monomers having a chain length of at least 4 carbon atoms; wherein the side chains are attached to the backbone at a single terminal point and wherein the at least one discrete hydrophobic side chain has a weight average molecular weight of 1000 to 30,000. These graft polymers are useful as dispersants in aqueous solutions, particularly in ink jet inks.

Graft copolymers containing sulfonate and phosphonate groups having

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Wilmington, DE, United States of America

Milan Bohuslav Bednarek