Taiyo Yuden Co., Ltd.

Mikio Sekiguchi

Hideyo Iida

Mizuho Imai

Nobuyasu Shiba

Kikuji Fukai

Komei Kato

Atsuo Ito

An atomizer for forming a thin film comprising an atomizing box, a guide tube having an open end of small diameter and an other open end of large diameter, a nozzle having an ejection outlet disposed in the atomizing box, an atomizing solution reservoir defined in the atomizing box adjacent to the open end of large diameter of the guide tube, and a fluid return passage defined around the circumference of the guide tube for returning the atomized solution from the atomizing solution reservoir to the one open end thereof. The atomizing box can contain a plurality of guide tubes each provided with a nozzle. The guide tube can also have a plurality of nozzles positioned therein.

Atomizer for forming a thin film

There is disclosed an atomized thin film forming apparatus for forming a thin film by spouting an atomized source solution toward a heated substrate. A pair of inner wall surfaces defined at the upper portion of a film forming nozzle and disposed opposite to each other with respect to the longitudinal direction of a film forming chamber are restricted so as to gradually narrow in the interval therebetween toward a spouting opening in a smooth curve. Hence, it is possible to prevent a mist of the source solution atomized by the atomizer from being locally stagnant in the film forming nozzle and prevent a precipitate of the atomized source solution from growing. Consequently, the flow of the mist of the source solution is not hindered by the precipitation of the atomized source solution so that the thin film is formed over the surface of the substrate at a high uniformity for a long period of time.

Atomized thin film forming apparatus

A thin film forming apparatus which forms a thin film over a surface of a subtrate by spraying a mist of a source solution produced by atomization over the surface of the substrate heated to a given temperature. The film forming apparatus is provided with a pair of guide members for supporting and guiding the substrate at opposite sides of the same. The distance between the opposite inner surfaces of the guide members can be changed according to the width of the substrate to be supported and guided by the pair of guide members. The distance between the respective lower portions of the opposite inner surfaces of the pair of guide members is greater than the distance between the upper portions of the opposite inner surfaces of the same, so that the distribution of the flow rate per unit flow passage area of the mist of the source solution is uniform with respect to the width of the substrate and enables a thin film of a uniform thickness to be formed over the entire surface of the substrate.

Thin film forming apparatus having adjustable guide

A thin film forming apparatus which forms a thin film over the film forming surface of a substrate by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate heated to a given temperature. The substrate conveying direction is reversible, or a nozzle for spouting the mist into a film forming chamber and an exhaust duct are connected removably to a hearth forming the bottom wall of the film forming chamber and can be switched with one another. The film forming apparatus is capable of forming thin films of different laminate constructions.

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Tokyo, Japan

Mikio Sekiguchi