Oki Electric Industry Co., Ltd.

Mikio Mouri

Tsukasa Watanabe

Tsutomu Nomoto

Hiroaki Kakinuma

Yukio Kasuya

Masaaki Sakamoto

Mamoru Yosida

In a contact-type image sensor comprising an array of photosensor elements for receiving light reflected from a document, and a protective layer disposed above the array of photosensor elements for protecting the array of photosensor elements when contact is made with the document, means are provided for discharging electric charges accumulated on the protective layer. This may comprise the protective layer with a relatively low resistivity or a separate conductive layer above or within the protective layer.

Direct-contact-type image sensor

In a thin-film transistor fabrication process using an amorphous silicon semiconductor layer, after the gate insulation layer is formed and before the a-Si semiconductor layer is formed, the surface of the gate insulation layer is treated with an H.sub.2 plasma. This treatment improves the transistor characteristics.

Thin-film transistor fabrication process

Growing community of inventors

Tokyo, Japan

Mikio Mouri