Ricoh Company, Ltd.

Mikio Kinoshita

Wasaburo Ohta

Makoto Harigaya

Masashi Nakazawa

Yoshiyuki Kageyama

Tatsuya Sato

Tadao Katsuragawa

Hiroshi Deguchi

Michiaki Shinotsuka

Michiharu Abe

Hajime Yuzurihara

Takashi Shibaguchi

Toru Miyabori

Tadao Katuragawa

A phase-change optical recording medium has a substrate, and a lower heat-resistant protective layer, a recording layer capable of recording and erasing information by utilizing changes in the phase of a phase-change recording material in the recording layer, an upper heat-resistant protective layer and a light reflecting and heat dissipating layer, which are successively overlaid on the substrate in this order, the recording material including Ag, In, Sb and Te as the main elements, at least one additional element selected from the group (1) consisting of B, C, N, Al, Si and P, and at least one additional element selected from the group (2) consisting of halogen atoms and alkali metal elements.

Phase-change optical recording medium

An optical recording medium includes a substrate, a first protection layer formed on the substrate, a recording layer formed on the first protection layer, a second protection layer formed on the recording layer, and a reflection heat radiating layer formed on the second protection layer. The recording layer is of a phase-change type in which the recording layer is changed from an amorphous state to a crystal state by a temperature raising and cooling process by projecting a laser beam onto the recording layer. The recording layer has an interface portion interfaced with one of the first and second protection layers. The interface portion has a thermal conductivity lower than that of a remaining portion of the recording layer.

Optical recording medium

A device for initializing an optical recording medium includes a semiconductor laser diode, and an optical system which projects a laser beam emitted from the semiconductor laser diode onto the optical recording medium. A half-value width of a spot of the laser beam focused on the optical recording medium is equal to 1/2 to 1/6 times a half-value width of a near-field pattern of the semiconductor laser diode in a direction parallel to a junction interface of the semiconductor laser diode, so that the optical recording medium can be evenly initialized by the laser beam.

Method and device for initializing optical recording medium of phase

A thin film magnetic head has a lower magnetic pole formed on a substrate; a coil arranged on the lower magnetic pole through an adhesive layer; an upper magnetic pole arranged on the coil; and a gap layer formed between the upper and lower magnetic poles. A method for forming the thin film magnetic head has a process for forming a lower magnetic pole on a first substrate; a process for forming a coil on a second substrate having a recessed portion; a process for polishing the first and/or second substrate such that a face of the lower magnetic pole on the first substrate and a face of the coil on the second substrate come in close contact with each other; a process for adhering the first and second substrates to each other such that the lower magnetic pole and the coil are adjacent to each other; a process for forming a gap layer on the lower magnetic pole; a process for polishing or etching a portion or all of the second substrate; and a process for forming an upper magnetic pole. In this magnetic head and the forming method, high performance can be obtained and cost of the thin film magnetic head can be reduced.

Method of forming a thin film magnetic head

A thin film deposition system includes a vacuum or evacuated casing in which there is introduced an active gas or an inert gas or a mixture thereof. A filament emits thermions which impinge upon gas molecules to ionize them into positive ions. The ions bombard a target, from which particles are emitted toward a substrate. The particles emitted from the target are also ionized by the thermions. In the vicinity of a grid, more particles from the target are ionized by thermions which are vertically oscillated and ionized molecules of the gas. The ions are accelerated toward the substrate and bombard the substrate, thereby depositing a thin film thereon. The thin film deposition system may additionally have an evaporation source for supporting an evaporant which emit particles to be deposited on the substrate.

Thin film deposition system

An apparatus for forming a thin film has a vacuum container to which an active gas, an inert gas or a mixture thereof is introduced, and a source of evaporation from which a substance is evaporated. A counter electrode is disposed in the vacuum container for holding a substrate for forming a thin film thereon in such a manner as to be opposed to the source of evaporation. A grid is disposed between the source of evaporation and the counter electrode and having openings which allow the evaporated substance to pass therethrough. A filament for thermionic emission is disposed between the grid and the source of evaporation. A target is also disposed between the filament and the source of evaporation for emitting sputtered particles. A power source device establishes predetermined electric potential relationships between the grid, the filament, and the target.

Thin film forming apparatus

A thin film deposition system includes an evacuated casing in which there is introduced an active gas or an inert gas or a mixture thereof. An evaporant carried by an evaporation source in the evacuated casing is evaporated and travels toward a substrate supported on the electrode. A filament for emitting thermions is disposed between the evaporation source and the electrode, and a grid for passing the evaporated material therethrough is disposed between the filament and the electrode. Power supplies are electrically connected to the evacuated casing, the evaporation source, the electrode, the filament, and the grid, for keeping the filament negative in potential with respect to the evacuated casing and the grid. Alternatively, the evacuated casing may not be connected to the power supplies so that the grid is kept positive with respect to the filament. The grid may be of a double-layer structure, with the gas inlet means connected to the grid.

An apparatus for forming a thin film having a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a generation device for generating a material vapor, a counter electrode holding a substrate to be vapor-deposited, a first grid disposed between the generation device and the electrode for accelerating the vapor, and a filament for emitting thermions to ionize the vapor. The grid and counter electrode surfaces may be curved and parallel to each other, and a second grid for accelerating the vapor, having a potential which is negative with respect to the potential of the first grid, may be placed between the first grid and the electrode, in the vicinity of the electrode, and a device may be provided for moving the first grid with respect to the electrode on a predetermined track.

Apparatus for forming a thin film

An apparatus for forming thin film includes a vacuum container to which an active gas, an inert gas, or a mixture thereof is introduced, a source of evaporation for evaporating a substance being evaporated in the vacuum container, a counter electrode disposed in the vacuum container and holding a substrate for forming a thin film thereon in such a manner as to be opposed to the source of evaporation, a grid disposed between the source of evaporation and the counter electrode and having openings which allow the substance being evaporated to pass therethrough, a filament for thermionic emission disposed between the grid and the source of evaporation and a power source device for establishing a predetermined electric potential relationship between the grid, the counter electrode, and the filament.

Apparatus for forming thin film

An apparatus for forming a thin film having a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a generation device for generating a material vapor, a counter electrode holding a substrate to be vapor-deposited, a first grid disposed between the generation device and the electrode for accelerating the vapor, and a filament for emitting thermions to ionize the vapor. The first grid and counter electrode surfaces may be curved and parallel to each other, and a second grid for accelerating the vapor, having a potential which is negative with respect to the potential of the first grid, may be placed between the first grid and the electrode, in the vicinity of the electrode, and a device may be provided for moving the first grid with respect to the electrode on a predetermined track.

An apparatus for forming a thin film having a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a source of evaporation for evaporating a substance, a counter electrode holding a substrate to be vapor-deposited, a grid disposed between the source and the electrode for accelerating the evaporated substance, and an electronic gun for emitting thermions, which are hit on the evaporated substances to ionize them.

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Kawasaki, Japan

Mikio Kinoshita