Jtekt Corporation

Mikio Fujioka

Hiroyuki Mori

Toshiyuki Saito

Kazuyuki Nakanishi

Hideo Tachikawa

Junji Ando

Naoyuki Sakai

Yoshiyuki Funaki

Kyouji Itou

An amorphous carbon film forming apparatus according to the present invention is characterized by being provided with a film forming furnace; plural workpiece fixturesfor supporting plural plate-like workpiecesin a state that the same are piled up vertically in parallel with the interval between facing surfaces of two vertically adjoining of the plate-like workpiecesbeing in a range of 2 to 30 millimeters, the plural workpiece fixturesbeing arranged within the film forming furnaceat a regular angular interval on a circle and being connected to a negative electrode; nozzlesprovided for supplying a processing gas and including at least one nozzle arranged at a center of the circle on which the plural workpiece fixturesare arranged and plural nozzles arranged at a regular angular interval on another circle which surrounds the workpieces fixturesradially outside thereof; and a plasma power supply connected to at least the workpiece fixtures. By controlling the supply gas pressure to be in a range of 13 to 1,330 Pa and a sheath width to be made in a range of 2 to 30 mm, the discharge is kept stably. As a consequence, it can be realized to form amorphous carbon films efficiently at a low cost.

Amorphous carbon film forming method and device

Growing community of inventors

Aichi, Japan

Mikio Fujioka