National Institute for Materials Science

Japan Electronic Materials Corporation

Japan As Represented by Director General of National Research Institute of Metals

Mikihiko Kobayashi

Takeshi Konno

Norio Shinya

Hiroshi Fudoji

Mitsuru Egashira

Kazumichi Machida

Atsuo Urata

Akira Ishida

It is an object of the present invention to provide a probe which can provide stable electrical conduction to an electrode of an object to be measured even when it is miniaturized. A probecomprises a columnar contact partwhich can come in contact with an electrodeof an object to be measured almost perpendicularly, and a base end (not shown) connected to the contact part, the contact partcomprises a base partand an expansion partbonded to an end of the base partin a width direction, and the expansion partis formed of a material having a thermal expansion coefficient higher than that of the base part

Bimetallic probe with tip end

A process for arranging a number of micro-bodies efficiently and precisely as one on one spot on a substrate. Charged spots are formed by a converging ion beam or the like on a substrate having an insulating property or the like, and micro-bodies having a size of 200 microns or less are attracted and stuck to the charged spots.

Process for precise arrangement of micro-bodies

A novel patterned thin film forming method is capable of realizing formation of nanometer-scale patterned thin films with high controllability by an easy and low-cost process. To form a patterned thin film on an insulating substrate in a precursor solution containing a film-forming substance, an electric charge pattern is formed on the insulating substrate, and then the insulating substrate is dipped in the precursor solution to deposit the film-forming substance on the electric charge pattern formed on the insulating substrate.

Method of forming patterned thin film

Growing community of inventors

Ishioka, Japan

Mikihiko Kobayashi