Jsr Corporation

Miki Tamada

Hiroyuki Komatsu

Tomoki Nagai

Hitoshi Osaki

Motohiro Shiratani

Sosuke Osawa

Ryo Kumegawa

Ken Maruyama

Tatsuya Sakai

Kazuki Kasahara

Katsuaki Nishikori

Provided are a method for forming a resist pattern that demonstrates excellent performance in sensitivity, resolution, etc. in an exposure step when a next-generation exposure technique is applied, and a radiation-sensitive resin composition. The method for forming a resist pattern includes step (1) of forming a resist film in which a content of a radiation-sensitive acid generator (C) is 0.1% by mass or less, step (2) of exposing the resist film to EUV or an electron beam (EB), and step (3) of developing the resist film exposed in the step (2).

Method for forming resist pattern and radiation-sensitive resin composition

A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Yis a single bond, &#x2014;CO&#x2014;NR&#x2014;, a divalent aromatic ring group, a divalent group containing &#x2014;O&#x2014;, or a divalent group containing &#x2014;CO&#x2014;NR&#x2014;. Ais a single bond, &#x2014;O&#x2014;, &#x2014;S&#x2014;, or &#x2014;NR&#x2014;. Ris a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

Method for producing film

A composition includes a polymer and a solvent. The polymer (A) satisfies at least one of the conditions (i) and (ii): (i) having in one terminal part of a main chain a block of a first structural unit that includes an amino group; and (ii) having a sulfur atom bonding to one end of the main chain, wherein a monovalent group that includes an amino group bonds to the sulfur atom.

Composition for underlayer film formation, underlayer film for directed self-assembled film and forming method thereof, and directed self-assembly lithography process

A method of producing a substrate includes: applying a composition on a metal basal plate to form a coating film; and forming a metal-containing layer on at least a part of the coating film. The composition contains a solvent, and a polymer having a first terminal structure and a second terminal structure in a single molecule. Each of the first terminal structure and the second terminal structure is at least one selected from the group consisting of a structure represented by formula (1) and a structure represented by formula (2). Aand Aeach independently represent a monovalent group having a functional group capable of forming a chemical bond with a metal atom. Lrepresents &#x2014;S&#x2014;, &#x2014;NR&#x2014;, or &#x2014;NA-, wherein Arepresents a monovalent group having a functional group capable of forming a chemical bond with a metal atom. 

Composition, polymer, and method of producing substrate

A modification method of a surface of a substrate includes: applying a composition on a surface of a metal substrate, and heating a coating film formed by the applying, wherein the composition contains: a polymer having a first structural unit that includes an aromatic ring, and a second structural unit that includes an ethylenic double bond; a thermal acid generating agent; and a solvent, wherein the polymer has a functional group capable of bonding to a metal atom in the metal substrate.

Modification method of substrate surface, and composition and polymer

A pattern-forming method includes forming a prepattern and including a first polymer is formed on a silicon-containing film on a substrate. An underlayer film including a second polymer is formed in recessed portions of the prepattern. A composition for directed self-assembled film formation including a third polymer is applied on the underlayer film and the prepattern. The first polymer includes a first structural unit. The second polymer includes: a molecular chain including the first structural unit and a second structural unit that differs from the first structural unit; and an end structure that bonds to one end of the molecular chain and includes at least one selected from the group consisting of an amino group, a hydroxy group and a carboxy group. The third polymer is a block copolymer including a block of the first structural unit and a block of the second structural unit.

Pattern-forming method and patterned substrate

A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of Rs are identical or different. 

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Miki Tamada