Mitsubishi Materials Corporation

Miki Adachi

Toshiaki Ueda

Takashi Kurihara

Yasuhiro Shato

Sung-Gyoo Lee

Tuyoshi Ogi

Takehiro Yonezawa

Tsuyoshi Ogi

A thermistor has a thermistor element, a protective film, and an electrode portion. The protective film is formed of a SiOfilm having a film thickness in a range of 50 nm or more and 1000 nm or less. The protective film is formed in contact with the thermistor element. Alkali metal is unevenly distributed in a region including an interface between the thermistor element and the protective film.

Thermistor with protective film and manufacturing method thereof

A surge protector coated with an oxide layer having an excellent chemical stability at the high temperature range and excellent adherence with respect to main discharge electrodes. The surge protector includes a column-shaped ceramic member that has a conductive film divided by a discharge gap interposed therebetween; a pair of main discharge electrode members opposite to each other on both ends of the column-shaped ceramic member to come in contact with the conductive film; and a cylindrical ceramic tube which is fitted to the pair of main discharge electrode members opposite to each other to seal both the column-shaped ceramic member and sealing gas inside thereof. Oxide films are formed on main discharge surfaces of at least the protrusive supporting portions of the pair of main discharge electrode members opposite to each other, by performing an oxidation treatment, respectively.

Method of forming a surge protector

This surge absorber includes an insulating part upon which is formed a conductive layer which is divided into two separate portions by a discharge gap (micro gap) around its circumferential surface; a pair of terminal electrodes which are arranged to oppose the insulating part, and contacts the conductive layer; an insulating tube at the ends of which the terminal electrodes are arranged, and which seals the insulating part in its interior along with seal gases; and a conductive portion provided at least between the terminal electrodes and the conductive layer. As a result, it becomes possible to provide a surge absorber of lower cost, and which is endowed with stabilized performance and high quality, while moreover it exhibits excellent durability.

Surge absorber and production method therefor

Surge protector

There is provided a surge absorber which has excellent chemical stability in a high-temperature region upon a sealing process and main discharge and has a long life span, by applying an oxide layer having excellent adhesion to a main discharge surface. A columnar ceramics in which conductive coating films are separately formed via a discharge gap, a pair of main discharge electrode members which face each other and are in contact with the conductive coating films and a barrel-shaped ceramics in which the columnar ceramics is enclosed together with sealing gas are included, and a glass member is enclosed in the barrel-shaped ceramics.

Surge absorber

Method for polishing surface of vapor-phase synthesized thin diamond film

A diamond powder, comprises diamond powder particles, and polar and non-polar groups, bonded onto surfaces of the particles. This seed diamond powder and a dispersed solution thereof can be used to seed a substrate for the deposition of diamond at a high nucleation density for chemical vapor deposition of synthetic diamond.

Growing community of inventors

Naka, Japan

Miki Adachi