Corning Incorporated

Exxonmobil Research and Engineering Company

Mikhail Sergeevich Chivilikhin

Ameya Vinay Joshi

Randall David Partridge

Amit Halder

Olivier Lobet

Pierre Woehl

David Robert Heine

Sylvain Maxime F Gremetz

Elena Daniela Lavric

Roland Guidat

Paul Oakley Johnson

Lev L Kuandykov

Cyclonic separation devices and fluid stream separating apparatuses incorporating cyclonic separation devices are described. A cyclonic separation device may include an exterior housing having an exterior cylindrical portion and an exterior conical portion extending from the exterior cylindrical portion and an interior housing having an interior cylindrical portion and an interior conical portion extending from the interior cylindrical portion. The interior housing is positioned relative to the exterior housing to form a circulating chamber. The cyclonic separation device also includes a fluid inlet coupled to the exterior housing, where the fluid inlet positioned to inject a fluid stream into the circulating chamber at an orientation generally tangential to the cylindrical portions of the exterior housing and the interior housing. The cyclonic separation device further includes a low-density outlet coupled to at least one of the exterior conical portion or the interior conical portion.

Integrated cyclone separation device

A microreactor includes a plurality of interconnected microstructures arranged in m process units with the process units configured to be operable together in parallel. Each of the m process units has a number n of respective process fluid inlets, wherein a number y of the n respective process fluid inlets are connected individually to respective non-manifolded fluid pumps, and wherein a number n minus y of the n respective process fluid inlets are connected to a respective manifolded fluid pump via a manifold, wherein y is an integer from 1 to n&#x2212;1 inclusive.

Devices and methods for microreactor fluid distribution

An exhaust gas after-treatment system includes at least first and second substrates. The first substrate has a first region and a second region circumferentially surrounding the first region. The first region of the first substrate has a higher average cell density than the average cell density of the second substrate. The system can also include at least a third substrate.

Flow modulating substrates for early light-off

A method of operating an exhaust gas after-treatment device with a substrate having a catalyst thereon directs exhaust gas through a first portion of the substrate during a cold-start of the after-treatment device, where the first portion of the substrate less than an entirety of the substrate. After light-off of the catalyst in the first portion of the substrate, exhaust gas is directed through the entirety of the substrate. An exhaust gas after-treatment device for carrying out the method includes a flow control device having a cold start configuration and a light off configuration, wherein the cold start configuration directs exhaust gas through the first portion of the substrate, and the light off configuration directs exhaust gas through the entirety of the substrate.

Exhaust gas after-treatment device and method of use

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St. Petersburg, Russia

Mikhail Sergeevich Chivilikhin