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Mikhail Ivanovich Khoma

Alexei Alexeevich Chuiko

Nikolai Vasilievich Khaber

Anatoly Borisovich Kondratenko

Valentin Anatolievich Tertykh

Vasily Ivanovich Vatamanjuk

Malvina Leontievna Galashina

Jury Davydovich Shaposhnikov

Valery Mikhailovich Maschenko

Alexei Dmitrievich Chugai

Alexandr Nikolaevich Kutin

Vilyam Alexandrovich Sobolev

Vyacheslav Valentinovich Pavlov

A method of producing fine-disperse alkylated silica compounds, characterized in that starting fine-disperse silica is subjected to treatment with water vapors at a temperature of 110.degree.-120.degree. C to attain the humidification degree of from 2 to 40 micromoles H.sub.2 O/m.sup.2 SiO.sub.2, the thus humidified silica being then treated with vapors of alkylchlorosilane at a temperature of 250.degree. to 310.degree. C. The method of the invention allows controlling the concentration of grafted alkyl groups in the resultant product within the range of from 4.7 to 8.0 micromoles of grafted alkyl groups per m.sup.2 of the surface of SiO.sub.2. Starting silica can be modified with oxides of metals, such as aluminium, titanium, iron or zirconium oxides, the resultant products exhibiting good hydrophobic properties when used as thickeners for lubrication materials.

Method of producing fine disperse alkylated silica compounds

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Kalush, Ivano-Frankovskoi oblasti, undefined

Mikhail Ivanovich Khoma