Timbre Technologies, Inc.

Mike Laughery

Junwei Bao

Nickhil Jakatdar

Vi Vuong

Srinivas Rao Doddi

Emmanuel Drege

Lawrence Lane

Kelly Barry

Makoto Miyagi

Specific wavelengths to use in optical metrology of an integrated circuit can be selected using one or more selection criteria and termination criteria. Wavelengths are selected using the selection criteria, and the selection of wavelengths is iterated until the termination criteria are met.

Selection of wavelengths for integrated circuit optical metrology

A method and apparatus for measuring the alignment of masks in a photolithographic process. A first grating is formed having lines and spaces on a wafer using a first mask having a pattern for the first grating. A second grating is formed having lines and spaces on the wafer using a second mask having a pattern for the second grating and also the pattern for forming the first grating. A determination is then made based on the difference in the width of either the lines or the spaces of the first and second gratings formed on the wafer if the first and second masks are misaligned.

Single pass lithography overlay technique

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Austin, TX, United States of America

Mike Laughery