The Clorox Company

Mike Kinsinger

Jared Heymann

William L Smith

David R Scheuing

William Ouellette

Thomas Fahlen

Nancy A Falk

Mona Marie Knock

Janiece Hope

Bernard Hill

Wenyu Zhang

Vidya Ananth

Ashish Kumar Jha

The invention relates to compositions and methods of treatment employing compositions comprising polyelectrolyte complexes. The compositions include a water-soluble first polyelectrolyte bearing a net cationic charge or capable of developing a net cationic charge and a water-soluble second polyelectrolyte bearing a net anionic charge or capable of developing a net anionic charge. The total polyelectrolyte concentration of the first solution is at least 110 millimolar. The composition is free of coacervates, precipitates, latex particles, synthetic block copolymers, silicone copolymers, cross-linked poly(acrylic) and cross-linked water-soluble polyelectrolyte. The composition may be a concentrate, to be diluted prior to use to treat a surface.

Precursor polyelectrolyte complexes compositions

Precursor polyelectrolyte complex compositions in dual chamber dispensing system

A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.

Low-VOC cleaning substrates and compositions containing a non-ionic surfactant

Precursor polyelectrolyte complexes compositions comprising oxidants

Low-VOC cleaning substrates and compositions consisting of a solvent mixture

The invention relates to preloaded cleaning and sanitizing wipes comprising a nonwoven substrate, and a cleaning formulation loaded onto or within the nonwoven substrate. The cleaning composition may include about 0.001% to about 10% by weight of an antimicrobial compound comprising a quaternary ammonium compound, less than about 4% by weight of an alcohol solvent containing a single hydroxyl group, a preservative, about 0.05% to about 10% by weight of a glycol solvent (e.g., preferably a glycol ether solvent), about 0.05% to about 10% of one or more surfactants, and water. The composition may have a pH from about 4 to about 8.

Preloaded dual purpose cleaning and sanitizing wipe

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Northampton, MA, United States of America

Mike Kinsinger