Hitachi-high-technologies Corporation

Mihoko Kijima

Ryoichi Matsuoka

Takumichi Sutani

Hitoshi Komuro

Shunsuke Koshihara

Kyoungmo Yang

Shigeki Sukegawa

In a method and apparatus for quantitatively evaluating two-dimensional patterns, a reference coordinate system is set in order to convert pattern edge information (one-dimensional data) acquired by measurement using an existing critical dimension machine into coordinate data. Thus, a pattern is converted into coordinate information. Next, a function formula is determined from this coordinate information by approximate calculation and a pattern is represented by the mathematical expression y=f(x). Integrating y=f(x) in the reference coordinate used when calculating the coordinate data gives the area of the pattern, whereby it is possible to convert the coordinate data to two-dimensional data.

Method of OPC model building, information-processing apparatus, and method of determining process conditions of semiconductor device

An amount of displacement and an overlapping area between first and second patterns formed through a double patterning lithography process can be determined. The first pattern is formed by a first exposure while the second pattern is formed by a later second exposure. A first image of the first pattern is formed prior to the formation of the second pattern. A second image of both patterns is formed after the formation of the second pattern. A two-step matching process between combined information and images of the first and second patterns is performed. The combined information includes information regarding the first pattern, as formed, combined with design information of the second pattern. Based on a moving amount of the design information of the second pattern, a displacement amount between the first and second patterns is determined.

Method for measuring sample and measurement device

Growing community of inventors

Tsukuba, Japan

Mihoko Kijima