Canon Kabushiki Kaisha

Michio Yanagisawa

Shinji Wakui

Takehiko Mayama

Ippei Uchida

Hirofumi Fujii

Kimitaka Ozawa

A measurement device for measuring a position of an object, includes an illuminator configured to illuminate the object, an image capturing device configured to capture the object illuminated by the illuminator, a calculator configured to obtain the position of the object based on an image obtained by the image capturing device, and a controller configured to control the illuminator and the image capturing unit. The controller outputs timing information indicating a timing determined in accordance with a measurement period that is an overlapping period of an illumination period for causing the illuminator to illuminate the object and an image capturing period for causing the image capturing device to capture the object.

Measurement device, processing device, and article manufacturing method

A microscope includes an illumination system, a stage, and an objective lens that forms an image of a specimen. The stage includes a fixed member whose position and inclination are fixed, a specimen holding member at least one of whose position and inclination is changeable, and a supporting member that supports the specimen holding member. A connection between the supporting member and the specimen holding member and a connection between the supporting member and the fixed member reside near sides of the specimen holding member. The microscope further includes an actuator that changes at least one of the position and the inclination of the specimen holding member with respect to the fixed member, and a buffer mechanism that suppresses transmission of any changes in the inclination of the specimen holding member to the actuator. The actuator and the specimen holding member are connected with the buffer mechanism interposed therebetween.

Microscope

A lithography apparatus includes a deflector configured to deflect the charged particle beam to scan the charged particle beam on the substrate in a scan direction; a detector including a shield for shielding the charged particle beam, and configured to detect an intensity of a charged particle beam not shielded by the shield; and a processor configured to process a signal obtained with the detector scanned with the charged particle beam in the scan direction by the deflector, wherein an effective region of the shield has a shape such that a position of an edge thereof in the scan direction continuously changes along the edge, and wherein the processor is configured to process the signal with respect to a plurality of positions of the edge to determine a relationship between a command value to the deflector and a scan position of the charged particle beam.

Lithography apparatus, and article manufacturing method

A vibration suppressing system includes a structural member with respect to which vibration suppression is to be executed, an actuator, having a pair of a fixed member and a movable member, for moving the movable member relative to the fixed member, and a first vibration sensor for measuring vibration of the structural member. A displacement sensor measures a movement distance of the movable member, a second vibration sensor measures vibration of the movable member, and a controller controls the actuator on the basis of outputs from the first vibration sensor, the displacement sensor and the second vibration sensor.

Growing community of inventors

Utsunomiya, Japan

Michio Yanagisawa