Daihen Corporation

Other

Tokyo Electron Limited

Tokyo Electron Yamanashi and Daihen Corporation

Michio Taniguchi

Shigeki Amadatsu

Masashi Kamitani

Kazuki Kondo

Satoshi Nii

Takenori Wakabayashi

Yuji Ishida

Shoichiro Minomo

Hiroyuki Kotani

Daisuke Matsuno

Hirotaka Takei

Yasuhiro Nishimori

Tatsuya Ikenari

Yoshiki Fukumoto

Hiroaki Oichi

Yoichi Kurono

Yoshinobu Kasai

Yoshinori Tsuruda

Yuji Yoshizako

Hayato Notomi

Akira Ishii

Hiroyuki Yoshiki

Masami Kubota

Eiji Tatebe

Kuniaki Miyoshi

Masato Sugiyo

Syoichiro Minomo

Katsushi Michishita

Techniques for suppressing an increase in reflected wave power (reflection coefficient) due to IMD are proposed. A high-frequency power supply system for providing a high-frequency power to a connected load includes: a bias power supply which outputs a bias power at a first frequency; a source power supply which outputs a source power at a second frequency higher than the first frequency; and a matching unit including an impedance matching circuit which acquires the bias power and the source power and matches an impedance of the source power supply side with an impedance of the load side. The source power supply determines a delay setting value indicating the timing of starting a frequency variation process with respect to the source power, performs the frequency variation process using the delay setting value and the value of the first frequency, and outputs a frequency-varied source power to the matching unit.

High-frequency power supply system

A plasma generation apparatus includes a chamber, a high-frequency power source, a magnetic field generator and a parallel capacitor. The chamber has an inner, toroidal-shaped electric discharge space. The high-frequency power source outputs a high-frequency current to the magnetic field generator, which generates a high-frequency magnetic field upon flowing of the high-frequency current therethrough. The parallel capacitor is connected in parallel to the magnetic field generator.

Plasma generation apparatus and high-frequency power source

An inductive-coupling plasma generation apparatus in which coupling can be made stronger and power can be used more effectively than in a conventional technique. The inductive-coupling plasma generation apparatus includes an electroconductive chamber with a toroidal-shaped electrical discharge space formed inside. The plasma generation apparatus also includes a high-frequency power source connected to the chamber. The power source is configured to cause a high-frequency current to flow through electroconductive material forming the chamber along a toroidal direction.

Plasma generation apparatus for generating toroidal plasma

There is provided a high frequency power supply device. The power control unit comprises an impedance adjuster that includes a variable reactance element and adjusts a load side impedance by changing a reactance value of the variable reactance element, and an impedance control unit that controls the variable reactance element of the impedance adjuster in response to a power value detected by a power detection unit so as to perform control of approximating the power value of the high frequency power, which is fed from the high frequency power generation unit to the load, to the setting value or control of maintaining the power value within the set allowable range by changing a resistance of the load side impedance in response to the power value detected by the power detection unit.

High frequency power supply device

A high frequency power supply includes a DC source unit () that outputs a DC voltage Vdc having an output level corresponding to a target voltage, an oscillation unit () that outputs a high frequency voltage signal having an output level corresponding to a target power, an amplification unit () that includes a plurality of amplifying elements, and amplifies and outputs the high frequency voltage signal output by the oscillation unit () utilizing the DC voltage output by the DC source unit (), an output voltage detection unit () that detects an amplitude of the voltage between the amplified-side terminals of the amplifying elements in the amplification unit (), or an amplitude of a voltage that is proportional to the amplitude of the voltage between the amplified-side terminals, and a target voltage decision unit () that decides a target value of the DC source voltage Vdc to be outputted by the DC source unit () based on the detection result from the output voltage detection unit ().

High frequency power supply

A conveying device in which a conveying arm assembly can be quickly set in a conveying position and can be rapidly stabilized in the conveying position includes a conveying arm assembly, a fixed shaft, at least one set of hollow operating shafts which are necessary for controlling an operation of the conveying arm assembly, and a motor provided between the fixed shaft and each of the operating shafts. The one set of operating shafts are attached to the fixed shaft such that they can be rotated coaxially with respect to the fixed shaft outside fixed shaft and are arranged in an axial direction of the fixed shaft. The conveying arm assembly is attached to an end portion of the operating shaft close to the ended of the fixed shaft. The motor comprises a stator provided on the fixed shaft and a rotor provided on each of the operating shafts such that it is opposed to the stator on an outer peripheral side of the stator. The stator is accommodated in a concave portion formed on an outer peripheral face of the fixed shaft.

Conveying device

A discharge tube is assembled from three sections formed of metal. A first discharge tube element and a second discharge tube element are connected with an insulator for forming a discharging gap and vacuum-sealing interposed between connecting flanges of both discharge tube elements along with an O-ring. The first discharge tube element and a third discharge tube element and a third discharge tube element are connected in a similar manner, and a discharge gap is formed between adjacent discharge tube elements. A high-frequency power supply is connected to each discharge tube element. Respective discharge tube elements are provided with cooling medium flow paths separately each other.

Multi-sectional plasma generator with discharge gaps between multiple elements forming a plasma discharge cavity

A plasma generator according to the invention includes a rectangular waveguide into which a microwave is introduced, a coaxial tube connected in a T shape to the rectangular waveguide through their respective openings, a vacuum sealing window for blocking the openings with an insulator to thereby vacuum seal the interior of the coaxial tube against the rectangular waveguide, and an insulator arranged in the coaxial tube as linked to the vacuum sealing window, thus facilitating microwave matching.

Microwave plasma generator

A conveying device in which a conveying arm assembly can be quickly set in a conveying position and can be rapidly stabilized in the conveying position is disclosed. The conveying device comprises a conveying arm assembly, a fixed shaft, at least one set of hollow operating shafts which are necessary for controlling an operation of the conveying arm assembly, and a motor provided between the fixed shaft and each of the operating shafts. The one set of operating shafts are attached to the fixed shaft such that they can be rotated coaxially with respect to the fixed shaft outside fixed shaft and are arranged in an axial direction of the fixed shaft. The motor comprises a stator provided on the fixed shaft and a rotor provided on each of the operating shafts such that it is opposed to the stator on an outer peripheral side of the stator.

A plasma monitoring apparatus for monitoring a condition of plasma of a plasma load to which power is supplied from a high frequency power source through an impedance matcher provides with a first input impedance calculator for calculating an impedance as a first input impedance from a supply-side terminal of the matcher to the plasma load-side based on voltage, current and phase difference detected at the supply-side terminal of the matcher, a second input impedance calculator for calculating an impedance as a second input impedance from a load-side terminal of the matcher to the plasma load based on a impedance of a element of the matcher and the first input impedance and a plasma impedance calculator for calculating an impedance of the plasma load from the second input impedance and an impedance of a supply-side connecting the matcher and the plasma load.

Plasma monitoring apparatus

The microwave generator with use of a magnetron comprises a microwave detector for detecting microwave output from the magnetron and a filament life diagnostic circuit for judging the life of filament of the magnetron by decreasing an input power to a filament of the magnetron from a normal state of the magnetron while monitoring the microwave output from the magnetron by the microwave detector, comparing the input power in the normal state of the magnetron with that just before the magnetron becomes unstable and judging the filament life based on the difference between the input power of the normal state and that just before the unstable state.

Magnetron microwave generator with filament-life diagnostic circuit

In a plasma processing s including a processing chamber and plate-parallel electrodes, provided in the processing chamber, for generating a high-frequency electric field in response to a high-frequency voltage, a ring-shaped core is provided in the periphery of the processing chamber, and a toroidal coil includes a plurality of 2n split coils wound in all the periphery of the ring-shaped core so that each pair of split coils oppose to each other. An alternating-current power source for generating a plurality of n-phase alternating-current currents including a plurality of n currents having a phase difference of either .pi./n or 2.pi./n therebetween, is electrically connected with the plurality of split coils of the toroidal coil so that two magnetic fields generated by the each pair of split coils opposing to each other are directed in the same direction in parallel to each other in the processing chamber, and the plurality of currents are respectively flowed into the respective pairs of split coils opposing to each other, thereby generating a rotating magnetic field in parallel to surfaces of the plane-parallel electrodes.

Plasma processing apparatus comprising means for generating rotating

In a microwave power source apparatus for a microwave oscillator for generating a microwave, a DC power source supplies a DC power for generating the microwave to the microwave oscillator. A measuring section of a voltage standing wave detector is mounted on a microwave transmission line connected between the microwave oscillator and a microwave load, and measures either one of an impedance seen looking toward the microwave load at a mounted point thereof and a reflection coefficient thereat by detecting a voltage standing wave of the microwave being generated by the microwave oscillator and propagating on the microwave transmission line. A controller calculates a progressive wave power of the microwave propagating on the microwave transmission line from the microwave oscillator toward the microwave load based on either one of the impedance and the reflection coefficient measured by the measuring section, and controls the DC power source to adjust the progressive wave power of the microwave to a predetermined desirable adjustment value based on the calculated progressive wave power.

Microwave power source apparatus for microwave oscillator comprising

In a plasma processing apparatus including a plasma chamber having a strip-shaped rectangular window having a longitudinal length formed in a side wall of the plasma chamber, an object to be processed is provided within the plasma chamber so as to be close to the window. The plasma processing apparatus includes a coupling rectangular waveguide having a strip-shaped rectangular slit formed in an E-plane thereof so as to extend in a direction of an axis thereof, wherein the coupling rectangular waveguide is provided so that the direction of the axis of the coupling rectangular waveguide is parallel to the longitudinal direction of the window of the plasma chamber. A coupling member made of a material for propagating a microwave is mounted between the slit of the coupling rectangular waveguide and the window of the plasma chamber, and electromagnetically couples the slit with the window in an airtight state. Further, a microwave generating unit is connected to the coupling rectangular waveguide to generate and supply a microwave into the coupling rectangular waveguide, thereby propagating the microwave through the slit of the coupling rectangular waveguide, the coupling member and the window of the plasma chamber into the plasma chamber.

Growing community of inventors

Osaka, Japan

Michio Taniguchi