Asahi Kasei Kogyo Kabushiki Kaisha

Michio Sudo

Kohei Nonaka

A cleaved surface of a crystal is used as a substrate for evaporation, and a high mobility semiconductor is evaporated to a thickness of 0.5 to 1.5 .mu.m to form a deposited thin semiconductor film, on which a first magnetizable member having a high magnetic permeability is applied with an adhesive. Subsequently the substrate is removed, and an electrode is formed on the exposed surface of the evaporated thin film, and a second magnetizable member is applied thereon with an adhesive. Where a special humidity resistance is required, a reinforcing layer of an electrically insulating and moisture-impervious inorganic material is formed directly on the evaporated thin semiconductor film before the first magnetizable member is applied.

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Kuki, Japan

Michio Sudo