Fujifilm Corporation

Michihiro Ogawa

Takashi Kawashima

Akihiro Kaneko

Yutaro Fukami

Junichi Ito

Tomotaka Tsuchimura

Yushi Kaneko

Michihiro Shirakawa

Hiroaki Idei

Masaomi Makino

Shigeki Uehira

Masatoshi Mizumura

Hajime Furutani

Makoto Fukuda

Akiyoshi Goto

Hideki Takakuwa

Wataru Nihashi

Mitsuhiro Fujita

Kyohei Arayama

Seiya Sakurai

Tatsuo Ishikawa

Shunsuke Kitajima

Hirotaka Takishita

Hisamitsu Tomeba

Daisuke Hamada

Hiromu Koizumi

Kyohei Sakita

Hironori Oka

Yasuharu Shiraishi

Kazuya Ota

An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern thus formed has excellent LER and collapse suppressing ability. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, and a resin whose polarity increases by the action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1), and a content of the repeating unit represented by General Formula (B-1) is 5% to 70% by mass with respect to all the repeating units in the resin. In General Formula (B-1), Ri represents a hydrogen atom or an organic group, the Ring W1 represents a ring which includes at least one carbon atom and one nitrogen atom, and may have a substituent

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin

Provided are a curable composition including a pigment, a resin having a structural unit represented by Formula 1, and a photopolymerization initiator; as well as a cured product obtained by curing the curable composition, a color filter including the cured product, a method for producing the color filter, and a solid-state imaging element or an image display device, each of which including the color filter. Rto Reach independently represent a hydrogen atom or an alkyl group, Xrepresents &#x2014;COO&#x2014;, &#x2014;CONR&#x2014;, or an arylene group, Rrepresents a divalent linking group, Lrepresents a group represented by Formula 2 or 3, Rrepresents an (n+1)-valent linking group, Xrepresents an oxygen atom or &#x2014;NR&#x2014;, Rrepresents a hydrogen atom, an alkyl group, or an aryl group, and n represents an integer of 1 or more.

Curable composition, cured product, color filter, method for producing color filter, solid imaging element, and image display device

A structure includes: a near infrared transmitting filter that shields light in a visible range and allows transmission of at least a part of light in a near infrared range; and a member that is provided on an optical path of the near infrared transmitting filter on at least one of an incidence side into the near infrared transmitting filter or an emission side from the near infrared transmitting filter, allows transmission of light in a near infrared range, and has a refractive index of 1.7 or higher for the light in the near infrared range.

Structure, solid image pickup element, infrared sensor, and composition

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can provide a resist film with excellent sensitivity and a pattern with excellent LER performance, and can suppress pattern collapse during pattern formation. In addition, the present invention also provides a resist film, a pattern forming method, a mask blank with a resist film, a method for producing a photomask, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin X having a repeating unit A represented by General Formula (I), a repeating unit B having an acid-decomposable group, and a repeating unit C selected from a repeating unit c1 represented by General Formula (II) and the like; a compound Y which is a basic compound or ammonium salt compound whose basicity is reduced upon irradiation with actinic rays or radiation; and a photoacid generator Z which is a compound other than the compound Y. 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a group represented by General Formula (1) and a compound that generates an acid upon irradiation with actinic rays or radiation. 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2,

Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

The present invention provides a negative tone photosensitive composition for EUV light, capable of forming a pattern, in which occurrence of missing defects is suppressed and pattern collapse is suppressed. The present invention also provides a pattern forming method and a method for manufacturing an electronic device. The negative tone photosensitive composition for EUV light of an embodiment of the present invention includes a resin A having a repeating unit having an acid-decomposable group with a polar group being protected with a protective group that is eliminated by the action of an acid, and a photoacid generator, in which a ClogP value of the resin after elimination of the protective group from the resin A is 1.4 or less, a value x calculated by Expression (1) is 1.2 or more, and the value x calculated by Expression (1) and a value y calculated by Expression (2) satisfy a relationship of Expression (3).

Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

The present invention provides a dispersion composition from which a curable composition having excellent developability can be obtained and in which generation of precipitates under a low temperature environment is suppressed. In addition, the present invention provides a curable composition, a light-shielding film obtained by curing the curable composition, a color filter containing a cured film obtained by curing the curable composition, a solid-state imaging device and an image display device, a resin, and a method for manufacturing a cured film. The dispersion composition of the present invention contains a colorant and a resin, in which the resin contains a structural unit A having a polymer chain and a structural unit B having an acid group, and the polymer chain contains 2 or more structural units GF, and the structural unit GF is selected from the group consisting of a structural unit composed of an oxyalkylene group and a structural unit composed of an oxyalkylene carbonyl group.

Dispersion composition, curable composition, light-shielding film, color filter, solid-state imaging device, image display device, resin, and method for manufacturing cured film

A curable composition contains a resin containing a curable group, a colorant, a polymerization inhibitor, and a polymerization initiator. A manufacturing method of the curable composition includes a colorant dispersing step of mixing together the resin containing a curable group, the colorant, and the polymerization inhibitor and a mixing step of mixing together the colorant dispersion and the polymerization initiator so as to obtain the curable composition. A cured film is obtained by curing the curable composition. A color filter, a solid-state imaging element, and an infrared sensor have the cured film. A manufacturing method of the cured film includes a curable composition layer-forming step, an exposure step, and a development step.

Curable composition, manufacturing method of curable composition, cured film, manufacturing method of cured film, color filter, solid-state imaging element, solid-state imaging device, and infrared sensor

An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device. The curable composition of the present invention includes a fluorine-containing polymer including a repeating unit represented by Formula (A) and a repeating unit represented by Formula (B), a polymerizable compound, and a coloring agent.  In Formula (A), Rrepresents a hydrogen atom or an alkyl group, and Lrepresents a divalent chained linking group having 3 or more carbon atoms in total, which may include an ester bond. In Formula (B), Rrepresents a hydrogen atom or an alkyl group, Lrepresents a single bond or a divalent linking group, and Rrepresents a monovalent organic group including an fluorine atom.

Curable composition, method for producing cured film, color filter, light-shielding film, solid-state imaging element, and image display device

A polyester resin composition including a ketene imine compound represented by the Formula (1) and polyester shows excellent hydrolysis resistance and prevents yellowing. At least one of R, R, Rand Rrepresents an alkyl, aryl, alkoxy or aryloxy group which may have a substituent; Rand Rrepresent an alkyl, aryl, alkoxy or aryloxy group which may have a substituent; Rrepresents an alkyl or aryl group which may have a substituent; and a and b represent an integer of 0 to 3. 

Ketene imine compound, polyester film, back sheet for solar cell module, and solar cell module

By forming a polyester film from a polyester resin composition including ketene imine compound represented by the following Formula (1) and polyester, the polyester film having excellent hydrolysis resistance in which volatilization of the ketene imine compound or the ketene compound can be suppressed. In Formula (1), Rand Rrepresent an alkyl group, an aryl group, an alkoxy group, an alkoxycarbonyl group, an aminocarbonyl group, an aryloxy group, an acyl group, or an aryloxycarbonyl group, and the R&#x2014;C(&#x2550;C)&#x2014;Rsubstructure has a molecular weight of 320 or greater. Rrepresents an alkyl group or an aryl group. 

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Haibara-gun, Japan

Michihiro Ogawa