Nuflare Technology, Inc.

Kabushiki Kaisha Toshiba

Michihiro Kawaguchi

Kiminobu Akeno

Keisuke Yamaguchi

Kazuhiro Shiba

Yoshinori Kagawa

Kiyoshi Nakaso

Keita Ideno

Keisuke Goto

Hitoshi Matsushita

Yu Asami

Shintaro Yamamoto

Kota Iwasaki

Kenichi Kataoka

Soichiro Mitsui

Yoshiro Yamanaka

Hirokazu Yoshioka

Shun Kanezawa

Kota Fujiwara

Ryota Inoue

Kentaro Omi

Yuki Fukuda

Yoshiaki Shinohara

Ryouta Inoue

Yuuki Fukuda

Tomoki Umetsu

A vacuum apparatus includes: a chamber; and a transfer robot transferring a processing object into the chamber, wherein the transfer robot includes an arm portion, a support portion provided at a tip of the arm portion and having a lower thermal conductivity than the arm portion, a plate provided between the support portion and the processing object and having a higher thermal conductivity than the support portion, and a support pad provided on the support portion and supporting the processing object by being in contact with the processing object while separating the processing object from the plate, a contact region allowing the support portion and the plate to be in contact with each other therein and a space region separated the support portion and the plate from each other are provided between the support portion and the plate, and the plate includes a projection configured as the contact region.

Vacuum apparatus

A charged particle beam irradiation apparatus according to an embodiment includes: an optical column; a stage; a mount supporting the stage; a chamber provided on the mount and supporting the optical column; a detector configured to detect movement of the stage; actuator units each including a curved plate, a piezoelectric element, and a connector connected configured to transmit a first force generated by a change of the curvature of the curved plate to the mount; and an actuator control circuit configured to control the voltage applied to the piezoelectric element of each of the actuator units based on movement information, so that the first force is transmitted from the actuator units to the mount against a second force acting on the mount due to the movement of the stage.

Charged particle beam irradiation apparatus

The vibration control system configured to control vibration of a vibration-controlled object is disclosed. The vibration control system comprises: (i) actuator units each including a piezoelectric element configured to expand and contract; (ii) a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract; (iii) a vibration detector configured to detect a status of vibration of the vibration-controlled object; and (iv) a vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively.

Vibration control system and optical equipment equipped therewith

A conductive contact point pin includes a pin body, and a plurality of convex portions formed in a tip portion of the pin body, wherein the conductive contact point pin breaks, by pressing a substrate where a film to be broken is formed on a conductive film from above the film to be broken, the film to be broken in order to be electrically connected to the conductive film.

Conductive contact point pin and charged particle beam apparatus

A substrate cover has a conductive frame body covering a surface circumference edge region and an upper circumference region of a substrate drawn with a charged particle beam, the conductive frame body comprising a notch portion provided at part of an inner circumference of the conductive frame body, and a recessed portion provided on the outer circumference side of the upper surface of the conductive frame body, such that the recessed portion is arranged adjacent to the notch portion in a direction of a frame width of the conductive frame body, and a conductive member provided on the recessed portion so as to pass through the notch portion to project inward to the inside of the frame of the conductive frame body, the conductive member comprising a contact portion electrically connected to the surface of the substrate, and a brim portion covering an upper portion of a gap.

Substrate cover

A mask cover according to one embodiment of the present invention comprises a frame body having an opening at the center, a conductive earth plate installed on the frame body such that its end protrudes into the opening of the frame body, an earth pin provided on the end of the earth plate and electrically connected to the earth plate, and a conductive cover part surrounding the earth pin such that the tip end of the earth pin protrudes and a gap is present between the cover part and the earth pin.

Mask cover, charged particle beam drawing apparatus and charged particle beam drawing method

A charged particle beam drawing apparatus according to one embodiment of the present invention comprises a load lock chamber provided for introducing a target object from the outside and capable of switching an atmosphere state and a vacuum state, a transfer chamber arranged so as to be able to communicate with the load lock chamber and transferring the target object, a soaking chamber arranged so as to be able to communicate with the transfer chamber and having a temperature adjustment container for housing the target object therein and controlling a temperature of the target object with radiation and a temperature adjustment part for controlling a temperature of the temperature adjustment container, and a drawing chamber arranged so as to be able to communicate with the transfer chamber and drawing on the target object at a constant temperature.

Charged particle beam drawing apparatus and charged particle beam drawing method

A charged particle beam writing apparatus according to an embodiment, includes a laser displacement meter configured to measure a position of a substrate to be written; a correction unit configured to correct a misregistration amount of the position of the substrate measured by the laser displacement meter from a reference position of the substrate; and a writing unit configured to write a pattern onto the substrate corrected for the misregistration amount by using a charged particle beam.

Charged particle beam writing apparatus and charged particle beam writing method

A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing.

A substrate coverincludes a conductive portionhaving a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portionseach formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate coverplaced thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover, the edge portion of the substrate is then irradiated with light from the irradiation means.

Substrate cover and charged particle beam writing method using same

One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage. The substrate position detecting method for charged particle beam photolithography apparatus includes placing a substrate on a stage that can be moved in an X-direction and a Y-direction; measuring a position in the X-direction of the stage while moving the stage in the X-direction, and illuminating obliquely an upper surface of the substrate with a laser beam to receive light reflected from the substrate with a position sensing device; computing a barycentric position of the reflected light when the stage is moved in the X-direction; measuring a position in the Y-direction of the stage while moving the stage in the Y-direction, and illuminating obliquely the upper surface of the substrate with the laser beam to receive light reflected from the substrate with the position sensing device; computing a barycentric position of the reflected light when the stage is moved in the Y-direction; and computing the positions of the substrate from the position measurement results of the stage and the computed barycentric position.

Growing community of inventors

Shizuoka, Japan

Michihiro Kawaguchi