Toagosei Company, Ltd.

Fujimi Incorporated

Michihiro Kaai

Naohiko Saito

Kohsuke Tsuchiya

Hisanori Tansho

Taiki Ichitsubo

Akitsugu Shibata

Yusuke Suga

Takayuki Takemoto

Eiichi Okazaki

Hideo Matsuzaki

Akihiro Gotou

Kenichi Nakamura

Kento Oomura

Katsunobu Mochizuki

Tomotaka Mizuno

Yuushi Andou

Hiroyuki Kamimura

Toshifumi Kondo

Masaru Andou

Kotaro Yoneda

A binder for secondary battery electrodes, which enables the achievement of a secondary battery electrode that has higher binding properties than ever before contains a block polymer that has a polymer block (A) and a polymer block (B), and it is configured such that: the polymer block (A) includes less than 30% by mass of a structural unit derived from (meth)acrylic acid to a total structural units of the polymer block (A); and the polymer block (B) includes 30 mass % or more and 100 mass % or less of a structural unit derived from (meth)acrylic acid to a total structural units of the polymer block (B).

Binder for a secondary battery electrode and use thereof

Provided is a curable-type composition, including a methylene malonate compound, a Lewis acidic compound, and a photo base generator.

Curable-type composition, two-component curable-type composition set, and method of producing adhered product

Provided is a polishing composition which contains a water-soluble polymer and is suitable for reducing LPDs. The polishing composition provided in this application includes an abrasive, a water-soluble polymer, and a basic compound. In the polishing composition, the content of a reaction product of a polymerization initiator and a polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis.

Polishing composition and method for producing same

A pressure-sensitive adhesive composition includes a block copolymer containing a polymer block (A) and a (meth)acrylic polymer block (B), wherein the polymer block (A) contains either or both of a maleimide compound and an amide group-containing vinyl compound as a constitutional monomer thereof and has a glass transition temperature of 100&#xb0; C. or higher, and the (meth)acrylic polymer block (B) contains at least one selected from compounds represented by general formula (1) as a major constitutional monomer thereof and has a glass transition temperature of 10&#xb0; C. or below.CH&#x2550;CR&#x2014;C(&#x2550;O)O(RO)&#x2014;R&#x2003;&#x2003;(1)(wherein, Rrepresents hydrogen or a methyl group; Rrepresents a linear or branched Calkylene group; Rrepresents hydrogen, a Calkyl group, or a Caryl group; and n represents 0 or an integer from 1 to 100.)

Pressure-sensitive adhesive composition and producing method thereof

An adhesive composition according to the present invention contains a polymerizable monomer (A) and a block copolymer (B) including a polymer block (a) which includes structural units derived from a styrene compound and from a maleimide compound, and an acrylic polymer block (b), in which the polymer block (a) and the acrylic polymer block (b) have a solubility parameter of 10.0 or more and 9.0 or more, respectively; the polymer block (a) contains the structural unit derived from a maleimide compound at a concentration from 30% by mass to 99% by mass with respect to the total mass of the polymer block (a); the polymer block (a) has a glass transition temperature of 150&#xb0; C. or higher; and the polymer block (b) has a glass transition temperature of 20&#xb0; C. or lower.

Adhesive composition

A process for producing polymer microparticles by suspension polymerization of a vinyl-based monomer in which, when polymer microparticles are produced by suspension polymerization of a vinyl-based monomer, a macromonomer having a radically polymerizable unsaturated group at a terminus of a vinyl-based monomer-derived polymer is used as a dispersion stabilizer.

Process for producing polymer microparticles

A process for producing a copolymer which comprises reacting a vinyl monomer with a macromonomer composition containing a macromonomer. The macromonomer composition is obtained by polymerizing at a temperature of 160 to 350&#xb0; C. a monomer mixture comprising 10 to 80 wt. % first vinyl monomer having an alkyl group in the &#x3b1;-position, 0 to 30 wt. % styrene as an optional ingredient, and 0 to 90 wt. % one or more other vinyl monomers based on the total amount of all monomers.

Methods for manufacturing a copolymer with a high yield by reacting a vinyl monomer and a macromonomer

A composition which is useful as a material with excellent weatherability, such as paints, printing ink, adhesive, filler, molding material, or resist, and is especially suitable for use in applications such as OPV and coating materials. The composition comprises as an active ingredient a polymer obtained by continuously polymerizing at a high temperature either a polymerizable monomer having a maleimide group and other polymerizable group or a polymerizable monomer having a succinimide group.

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Nagoya, Japan

Michihiro Kaai