Meidensha Corporation

Michihiro Hatanaka

Daizo Takahashi

Toshinori Tatsumi

An emitter () and a target () are arranged so as to face each other in a vacuum chamber (), and a guard electrode () is provided at an outer circumferential side of an electron generating portion () of the emitter (). The emitter () is supported movably in both end directions of the vacuum chamber () by the emitter supporting unit () having a movable body (). The emitter supporting unit () is operated by an operating unit () connected to the emitter supporting unit (). By operating the emitter supporting unit () by the operating unit (), a distance between the electron generating portion () of the emitter () and the target () is changed, and a position of the emitter () is fixed at an arbitrary distance, then field emission is performed with the position of the emitter () fixed.

Field emission device and field emission method

Emitter () and target () are arranged so as to face each other in vacuum chamber (), and guard electrode () is provided at outer circumferential side of electron generating portion () of emitter (). Guard electrode () is supported movably in directions of both ends of vacuum chamber () by guard electrode supporting unit (). To perform regeneration process of guard electrode (), guard electrode () is moved to opening () side (to separate position) by operating guard electrode supporting unit (), and a state in which field emission of electron generating portion () is suppressed is set, then by applying voltage across guard electrode (), discharge is repeated. After performing regeneration process, by operating guard electrode supporting unit () again, guard electrode () is moved to opening () side (to emitter position), and a state in which field emission of electron generating portion () is possible is set.

Electric field radiation device and regeneration processing method

Disclosed is a method for manufacturing a vacuum capacitor () provided with an insulating pipe (), terminal electrodes () that are disposed at open ends of the insulating pipe (), and spiral electrodes () that are connected to the terminal electrodes (). An electrode plate () and a spacer () are wound on a core member () to prepare a spiral electrode (), and an electrode plate () and a spacer () are wound on a core member () to prepare a spiral electrode (). A linear brazing material () is disposed in a groove () formed in a surface of the terminal electrode () on an inner side of the insulating pipe (). A platy brazing material () is sandwiched between the terminal electrode () and the spiral electrode () to fix the spiral electrode () to the terminal electrode (). The insulating pipe () and the spiral electrode () are placed on the terminal electrode (), and the terminal electrode () is disposed on the insulating pipe (), thereby temporarily assembling the vacuum capacitor (). The vacuum capacitor () is put into a vacuum heating furnace, and the terminal electrode () and the spiral electrode (), the terminal electrode () and the spiral electrode (), and the insulating pipe () and the terminal electrodes () are respectively brazed.

Capacitor manufacturing method

Emitter () and target () are arranged so as to face each other in vacuum chamber (), and guard electrode () is provided at outer circumferential side of electron generating portion () of emitter (). Emitter () is supported movably in both end directions of vacuum chamber () by emitter supporting unit () having movable body (). To perform regeneration process of guard electrode (), emitter is moved to no-discharge position by operating emitter supporting unit, and state in which field emission of electron generating portion () is suppressed is set, then by applying voltage across guard electrode (), discharge is repeated. After regeneration process, by operating emitter supporting unit again, emitter is moved to discharge position, and state in which field emission of electron generating portion () is possible is set with movement of movable body () toward the other and side being restrained by movement restraining unit ().

Growing community of inventors

San Jose, CA, United States of America

Michihiro Hatanaka