Applied Materials, Inc.

Optimedica Corporation

Michelle SanPedro

David D Scott

Steven Scott Christensen

Jeffrey A Golda

Antonio D Lucero

Eric B Lafay

Brian Riley

Raymond B Cota

Qi Wu

Keith R Berding

Michael C Kutney

Zhaozhao Zhu

Blake Erickson

Soumendra N Barman

Philip Allan Kraus

Kelvin Chan

Adolph Miller Allen

Kenric T Choi

Amir Bayati

William John Durand

Xiaopu Li

Xinyuan Chong

Weize Hu

Abdullah Zafar

Suresh Polali Narayana Rao

Adam K Hoopai

Methods and apparatus for processing a substrate are provided herein. For example, a gas supply configured for use with a processing chamber includes an ampoule that stores a precursor and comprises an input to receive a carrier gas and an output to provide a mixture of the carrier gas and the precursor to the processing chamber and a sensor assembly comprising a detector and an infrared source operably connected to an outside of an enclosure, through which the mixture flows, and a gas measurement volume disposed within the enclosure and along an inner wall thereof so that a concentration of the precursor in the mixture can be measured by the detector and transmitted to a controller.

Methods and apparatus for processing a substrate

Embodiments disclosed herein include a sensor. In an embodiment, the sensor comprises a board, wherein an aperture is formed through the board, a current loop winding through the board around the aperture, and a voltage ring around the aperture and within an inner perimeter of the current loop, wherein the voltage ring comprises an interior ring, an insulator ring around the interior ring, and an exterior ring around the insulator ring.

RF measurement from a transmission line sensor

A system includes a memory, and at least one processing device, operatively coupled to the memory, to facilitate an etch recipe development process by performing operations including obtaining, from an optical detector, first material thickness data for a first material and second material thickness data for a second material resulting from an iteration of an etch process using an etch recipe. The first material is located at a first reflectometry measurement point and the second material is located at a second reflectometry measurement point different from the first reflectometry measurement point. The operations further include determining one or more etch parameters based on at least the first material thickness data and the second material thickness data.

Multiple reflectometry for measuring etch parameters

A system includes a memory and at least one processing device operatively coupled to the memory to facilitate an etch recipe development process by performing a number of operations. The operations include receiving a request to initiate an iteration of an etch process using an etch recipe to etch a plurality of materials each located at a respective one of a plurality of reflectometry measurement points, obtaining material thickness data for each of the plurality of materials resulting from the iteration of the etch process, and determining one or more etch parameters based on the material thickness data.

Base with wheels for a mobile patient bed

Headrest for mobile patient bed

Mobile patient bed

Mobile patient bed controller

Growing community of inventors

Mountain View, CA, United States of America

Michelle SanPedro