Clariant Finance (bvi) Limited

Clariant International Ltd

Michelle M Cook

M Dalil Rahman

Ping-Hung Lu

Stanley F Wanat

Douglas S McKenzie

Sunit S Dixit

Carlo R Spilletti

The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.

Fractionated novolak resin from cresol-formaldehyde reaction mixture and

The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such a novolak resin fraction. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.

Fractionated novolak resin and photoresist composition therefrom

The present invention provides methods for solutions having a very low level of metal ions, utilizing a specially designed Ion Exchange Pack. A method is also provided for producing photoresist composition having a very low level of metal ions from novolak resins purified in a process using such an Ion Exchange Pack.

Trace metal ion reduction by Ion Exchange Pack

The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.

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Somerville, NJ, United States of America

Michelle M Cook