Coherent, Inc.

Michele Wayne Winz

Lei Meng

Sergei V Govorkov

Andrea Caprara

Wolfram Urbanek

Michael Hertwig

James Schloss

Kevin Shea

Jim Schloss

Sam Mallicoat

Guang Li

Larry Potter

Jordan Wesley Crist

An apparatus includes a beam source, beam forming optics, a first focusing lens having a focal length, a second focusing lens having a focal length similar to the focal length of the first lens, and a lens translator configured to move the second lens transversely relative to the beam forming optics and to the first lens, and thereby move the elongated focus transversely. In some embodiments, the beam forming optics are positioned between the beam source and the first focusing lens, the first focusing lens is positioned between the beam forming optics and the second focusing lens, and the beam forming optics, the first focusing lens, and the second focusing lens are arranged to receive a beam of laser radiation from the beam source and to form the beam into an elongated focus.

Beam forming with focus location adjustment

An anamorphic three-element objective lens projects a plurality of beams of different wavelengths and different diameters into an elongated focal spot in a working-plane. In one transverse direction of the lens, the beams are tightly focused with equal beam-waist widths in the working-plane, defining a height of the focal spot. In another transverse direction, the different beams are focused progressively beyond the working-plane such that the beams have a common beam-width in the working-plane, thereby defining a width of the focal spot.

Achromatic astigmatic anamorphic objective

In a flow cytometer, an objective lens for focusing an input laser-radiation beam including at least four different laser-radiation wavelengths in a common plane includes only three singlet lens-elements. Two of the elements are cylindrical elements arranged as a cylindrical telescope for shaping and reducing the size of the input laser-beam. The third element is a spherical element arranged to focus the reduced size beam in the common plane. In one example, all three elements are made from the same optical material.

Achromatic anastigmatic anamorphic objective

A mirror is used to form a beam of laser-radiation having a uniform intensity distribution from a beam of laser-radiation having a non-uniform intensity distribution. The mirror has a reflective surface that has a compound shape, which is two inclined surfaces joined by a rounded apex. The compound-mirror is achromatic and can form a uniform intensity distribution from a polychromatic beam of laser-radiation. The uniform intensity distribution may be an isotropic distribution or a flat-top distribution in a plane. The non-uniform intensity distribution may be a Gaussian distribution from a laser source.

Reflective laser line-beam generator

An optical apparatus for delivering to a flow-cell of a flow-cytometer a plurality of beams of laser radiation each thereof having a different wavelength. The apparatus includes a dispersion compensation-prism and a plurality of directing-prisms equal in number to the number of laser-beam. The directing-prisms are arranged to direct the laser radiation beams directly therethrough into the dispersion compensation-prism as converging fan of beams in a first plane. The beams are transmitted by the compensation-prism as a converging fan of beams intersecting then proceeding as a diverging fan of beams in the first plane. A spherical focusing lens is arranged cooperative with a cylindrical lens for focusing the plurality of laser-beams as a plurality of spaced apart elongated focal spots in a plane in which the cytometer flow-cell is located.

Apparatus for delivery of laser-beams of different wavelengths to a flow-cytometer

A laminated wafer sensor structure includes a housing layer having pocket openings formed therein, a circuit layer having a sensor element and electronic components mounted for registration with the pocket openings in the housing layer, and a rigid back layer. The laminated structure is suitable for handling by conventional robotic wafer handling systems. The wafer sensor structure is adapted for electrical connection to a base station that is also adapted for connection to a host computer system to facilitate communication among the sensor structure, the base station and the host computer.

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Woodburn, OR, United States of America

Michele Wayne Winz