Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Michel Riepen

Martinus Hendrikus Antonius Leenders

Sjoerd Nicolaas Lambertus Donders

Jeroen Johannes Sophia Maria Mertens

Christiaan Alexander Hoogendam

Nicolaas Ten Kate

Bob Streefkerk

Roelof Frederik De Graaf

Nicolaas Rudolf Kemper

Rogier Hendrikus Magdalena Cortie

Hans Jansen

Cornelius Maria Rops

Paulus Martinus Maria Liebregts

Jan-Gerard Cornelis Van Der Toorn

Franciscus Johannes Joseph Janssen

Joost Jeroen Ottens

Marco Koert Stavenga

Fabrizio Evangelista

Erik Roelof Loopstra

Koen Steffens

Richard Moerman

Sergei Shulepov

Martinus Cornelis Maria Verhagen

Hernes Jacobs

Patricius Aloysius Jacobus Tinnemans

Johannes Henricus Wilhelmus Jacobs

Jacobus Johannus Leonardus Hendricus Verspay

Theodorus Petrus Maria Cadee

Erik Henricus Egidius Catharina Eummelen

Boris Menchtchikov

Johannes Anna Quaedackers

Antonius Johannus Van Der Net

Herman Boom

Frederik Eduard De Jong

Stoyan Nihtianov

Christianus Gerardus Maria De Mol

Eva Mondt

Koen Goorman

Marcel Johannus Elisabeth Hubertus Muitjens

Martin Frans Pierre Smeets

Bart Leonard Peter Schoondermark

Marcel Beckers

Ronald Van Der Ham

Paul Petrus Joannes Berkvens

Henricus Jozef Castelijns

Maria Elisabeth Reuhman-Huisken

Christophe De Metsenaere

Hendrikus Gijsbertus Schimmel

Daniel Jozef Maria Direcks

Peter Smits

Sebastiaan Maria Johannes Cornelissen

Gert-Jan Gerardus Johannes Thomas Brands

Johannes Catharinus Hubertus Mulkens

Niek Jacobus Johannes Roset

Wilhelmus Franciscus Johannes Simons

Jim Vincent Overkamp

David Bessems

Marcio Alexandre Cano Miranda

Marcus Martinus Petrus Adrianus Vermeulen

Han Henricus Aldegonda Lempens

Danny Maria Hubertus Philips

Anthonie Kuijper

Aschwin Lodewijk Hendricus Johannes Van Meer

Marco Polizzi

Patrick Johannes Wilhelmus Spruytenburg

Reinier Theodorus Martinus Jilisen

Johannes Hubertus Josephina Moors

Dzmitry Labetski

Johannes Petrus Maria Smeulers

Johannes Christiaan Leonardus Franken

Jimmy Matheus Wilhelmus Van De Winkel

Ramin Badie

Clemens Johannes Gerardus Van Den Dungen

Robertus Nicodemus Jacobus Van Ballegoij

Wilbert Jan Mestrom

Jan Willem Cromwijk

Vadim Yevgenyevich Banine

Raymond Wilhelmus Louis Lafarre

Johannes Petrus Martinus Bernardus Vermeulen

Jan Bernard Plechelmus Van Schoot

Dirk Heinrich Ehm

Nina Vladimirovna Dziomkina

Andrei Mikhailovich Yakunin

Gerardus Hubertus Petrus Maria Swinkels

Marinus Jochemsen

Marco Baragona

Lucas Henricus Johannes Stevens

Noud Jan Gilissen

Laurentius Johannes Adrianus Van Bokhoven

Vladimir Mihailovitch Krivtsun

Olav Waldemar Vladimir Frijns

Bastiaan Theodoor Wolschrijn

Takeshi Kaneko

Norbertus Benedictus Koster

Dennis De Graaf

Christianus Wilhelmus Johannes Berendsen

Ronald Johannes Hultermans

Thomas Stein

Jacob Marinus Jan Den Toonder

Pieter Lein Joseph Gunter

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Lithographic apparatus and a method of operating the apparatus

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Fluid handling structure, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Lithographic apparatus and device manufacturing method

A debris mitigation system for use in a radiation source. The debris mitigation system comprises a contamination trap. The contamination trap comprises a debris receiving surface arranged to receive liquid metal fuel debris emitted from a plasma formation region of the radiation source. The debris receiving surface is constructed from a material that reacts with the liquid metal fuel debris to form an intermetallic layer on the debris receiving surface.

Debris mitigation system, radiation source and lithographic apparatus

A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Radiation source and lithographic apparatus

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a substrate temperature control system configured to provide a control signal to control a substrate temperature conditioning system based on a determined temperature; and a parameter control system configured to adjust a lithographic apparatus parameter, that is other than, or in addition to, the control signal, based on temperature information of the substrate and/or substrate table or on a measure derived from the temperature information.

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Veldhoven, Netherlands

Michel Riepen