Asml Netherlands B.v.

Michel Pieter Dansberg

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Harmen Klaas Van Der Schoot

Sebastiaan Maria Johannes Cornelissen

Rob Jansen

Robert Johannes Petrus Van Diesen

Pieter Kruit

Guido De Boer

Robert-Han Munnig Schmidt

Robert-Han Munnig-Schmidt

The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target () such as a wafer, said target being included in said system by means of a target table (), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target () and target table (), a pressure drop (P) arises.

Lithography system, method of clamping and wafer table

An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

Apparatus configured to position a workpiece

A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.

Lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Michel Pieter Dansberg