Commissariat a L'energie Atomique

Gemplus Card International

Michel Papapietro

Chantal Arena

Jean-Christophe Fidalgo

Jean-Pierre Joly

Patrice Noel

Jel Turin

Integrated circuit card comprising means for the protection of the

The invention relates to a gaseous phase chemical treatment reactor for wafers. The aim of the invention is to produce a reactor in which only the face of the wafer to be treated is in fact treated. This aim is achieved with the aid of a reactor comprising at least one treatment chamber (19) located within a main chamber (9) and connected by one of its ends to means (17) for injecting a treatment gas onto a wafer (1) and by its other end to a means (15) for securing said wafer, in that the latter is gripped between a heating susceptor or base (13) and the retaining means (15) in such a way as to seal said treatment chamber (19) and maintain within the latter a pressure below that of the main chamber (9). The invention more particularly relates to reactors for depositing tungsten on silicon wafers.

Gaseous phase chemical treatment reactor

Growing community of inventors

Lyons, France

Michel Papapietro