Carl Zeiss Laser Optics Gmbh

Carl Zeiss Smt Gmbh

Carl Zeiss Multisem Gmbh

Michel Le Maire

Holger Muenz

Willi Anderl

Johannes Kraus

Michael Schall

Ulrich Weber

Vitaliy Shklover

Holger Kierey

Markus Bauer

Jeffrey Erxmeyer

Bernhard Weigl

Ingrid Schuster

Hubert Holderer

Dirk Zeidler

Alois Herkommer

Joerg Jacobi

Rafael Egger

Thorsten Tritschler

Anton Lengel

Christian Hoess

Holger Münz

Gerhard Derst

A system combination includes a particle beam system and a light-optical system. The particle beam system can be an individual particle beam system or a multiple particle beam system. A light entry mechanism can provided at a branching site of a beam tube arrangement within a beam switch. A light beam of the light-optical system can enter into the beam tube arrangement through the light entry mechanism such that the light beam impinges, in substantially collinear fashion with particle radiation, on an object to be inspected. Parts of the light-optical beam path and parts of the particle-optical beam path can extend parallel to one another or overlap with one another. This arrangement can allow light of the light-optical system to be incident in perpendicular fashion on an object to be inspected, optionally without impairing the particle-optical resolution of the particle beam system.

System combination of a particle beam system and a light-optical system with collinear beam guidance, and use of the system combination

A beam reverser module for an optical power amplifier of a laser arrangement comprises at least one reflecting surface for receiving an incoming laser beam propagating in a first direction and reflecting the incoming laser beam into a second direction different from the first direction, wherein the at least one reflecting surface is a highly reflecting surface of at least one mirror.

Beam reverser module and optical power amplifier having such a beam reverser module

A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.

Reflective optical element for use in an EUV system

A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers &#x2267;1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra&#x2014;recorded by the at least one detector&#x2014;of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.

Method for measuring a spectrum of a narrowband light source, and spectrometer arrangement

An optical system for shaping an incoming beam having a divergence with an angular distribution at least in a first direction comprises at least one angle selective optical element for clipping the angular distribution in the at least first direction. The approach according to the present invention bases on using an angle-selective device operated by the principle of total internal reflection to reduce divergence of the incoming beam, in contrast to a spatially-selective device as for example a field-stop or slit. The method according to the present invention has the advantage that no physical sharp edges have to be exposed at high energy densities. Thus, thermal impact and demands on the optical elements to withstand a high power laser beam are significantly reduced.

Optical system and method for shaping a profile of a laser beam

The disclosure relates to a light beam intensity non-uniformity correction device that includes an optical element having a light entrance face with an antireflective property. According to the invention the antireflective property is locally amended in order to enhance light beam intensity uniformity. The disclosure further relates to a method for amending intensity distribution of a light beam in an optical system having one or more optical elements, where the method includes: a) assembling the optical system with the one or more optical elements arranged in predetermined positions, b) measuring intensity distribution, c) calculating locally required increase or decrease in absorption and/or reflection of one of the optical elements to amend measured intensity distribution into a predetermined intensity distribution, d) removing the optical element from the optical system, e) locally amending absorption and/or reflection of the one of the optical elements according to the calculation, f) installing the optical element in the predetermined position in the optical system.

Optical devices and related systems and methods

Growing community of inventors

Oberkochen, Germany

Michel Le Maire