Commissariat a L'energie Atomique

Other

Etat Francais Represente Par Le Delegue General Pour L'armement

Michel Ida

Brigitte Montmayeul

Marc Rabarot

Patrick Chaton

Raymond Charles

Robert Baptist

Michel Borel

Alain Fargeix

Aim&eacute; Perrin

Alexandre Lagrange

Fran&ccedil;ois Perraut

A device for reading a biochip including plural molecular recognition areas and plural optical positioning marks, associated with recognition areas. The device includes an optical head capable of projecting excitation light onto the biochip. A device is provided to effectuate relative displacement between the head and the biochip. A first optical analysis system is associated with the optical head to receive any light arriving from recognition areas. A second optical positioning system is associated with the optical head to receive any light from at least one guide track and/or optical positioning mark. A device is further provided for servocontrolling scanning by the optical head. Such a device may find particular application to biological and chemical analysis.

Biochip and biochip reading device comprising a plurality of zones for molecular recognition

An apparatus for depositing a material by evaporation on a substrate having a large surface. The apparatus includes an enclosure in which are placed a number of material evaporation sources. It also includes a device for channeling or piping of vapors emitted by the sources toward the substrate during evaporation. This is formed by walls or covers which define compartments within the enclosure, each evaporation source being placed in a compartment. The apparatus can also utilize a device for moving the substrate in order to improve the uniformity of the deposit.

Apparatus for depositing a material by evaporation on large surface substrates

Process and apparatus for the formation of patterns in a photosensitive resin layer or photoresist by continuous laser irradiation, application to the production of microtip emissive cathode electron sources and flat display screens. Formation takes place of non-mutually interfering elementary light beams (41), there is at least one relative translation at constant light power and speed of said beams with respect to the layer in order to irradiate lines thereof, each line receiving a light dose lower than that necessary for the development of the resin, a relative rotation of all the beams with respect to the layer takes place, the translation is recommenced in order to irradiate other lines, each line receiving a light dose complimentary to the preceding dose and the resin is developed.

Process and apparatus for the formation of patterns in a photoresist by

A method and a device for the formation of holes in a layer of photosensitive material, in particular for the manufacture of electron sources. This method is characterized in that a membrane (121) with micro-perforations (122) is laid onto the layer of photosensitive material (120); the layer of photosensitive material is insolated through the membrane (121) in order to print areas (125) corresponding to the micro-perforations (122); the membrane (121) is separated from the layer of photosensitive material (120) thus insolated and the photosensitive layer (120) is then developed in order to form holes in it corresponding to the insolated areas (125).

Method and device for the formation of holes in a layer of

A high reflectivity, broad band mirror for a high flux laser and a process for producing such a mirror. The mirror includes a substrate on which is formed a metallic layer such as aluminum. A stack of layers are formed on the metallic layer. The stack includes alternating layers of two materials with the refractive index of one material being higher than that of the other. A surface layer of a third material is placed on the stack. The surface layer has a refractive index which varies in accordance with the continuous periodic profile. The mirror is formed by depositing the metallic layer on a substrate and forming the stack by an ion beam sputtering method.

High reflectivity, broad band mirror and process for producing such a

A device for insolating micrometric areas in a photosensitive layer and a method for producing patterns in such a layer. The method is characterized in that the layer is subjected to an atmosphere containing a transparent liquid that does not wet the photosensitive material, in order to produce on this layer a monolayer of micro-droplets (121), the layer of photosensitive material is insolated through the monolayer of micro-droplets (121) in order to selectively print the areas of exposure (122) of the layer, the micro-droplets (121) are removed, and the layer of photosensitive material is developed in order to form said patterns in accordance with the areas of exposure.

Device for the insolation of micrometric and/or submicrometric areas in

A process for the formation of holes in a photosensitive resin layer, which can be applied to the production of electron sources having emissive cathodes with microtips and flat display screens. According to this process, a resin layer is exposed through a monolayer of balls transparent to an exposure light, with each ball focussing the light onto the resin layer and in this way bringing about the exposure of an area of said resin layer so that the thus exposed resin layer is developed.

Growing community of inventors

Voreppe, France

Michel Ida