Commissariat a L'energie Atomique Et Aux Energies Alternatives

Commissariat a L'energie Atomique

Commissariat a L'energie Atomique Et Aux Alternatives

Michel Heitzmann

Francois Marion

Pierre Jeuch

Jean-Francois Damlencourt

Marion Volpert

Emeline Saracco

Jean-François Damlencourt

Philippe Laporte

Baptiste Goubault De Brugiere

Stéphane Lagarrigue

Jean Lajzerowicz

A method producing a refractive or diffractive optical device, including: production, in a first layer, of at least one inclined general profile approximated by a staircase profile including plural stairsteps; production of the profile including: forming buffer patterns on the first layer and at least one sequence including: forming masking patterns, so each masking pattern includes at least one edge situated above a buffer pattern and covers at least one area of the first layer not masked by the buffer patterns, the forming the masking patterns also defining, for the first layer, plural free areas not masked by the masking patterns or by the buffer patterns; etching the free areas to form trenches in the first layer. The production of the profile also includes: removing the masking patterns, removing the buffer patterns revealing walls previously covered by the buffer patterns, and then an isotropic etching to remove the walls.

Method for producing a refractive or diffractive optical device

A connecting system having a female element including a hollow flared part for receiving and guiding a male element and a hollow mating part for mating with the male element. A part to be mated of the male element has an outside diameter that before the mating is larger than an inside diameter of the mating part of the female element, and the part to be mated of the male element is made of a material that can be strained and has a corrugated transverse cross section, so as to contract when it is plugged into the mating part of the female element, and/or the mating part of the female connection element is made of a material that can be strained and has a corrugated transverse cross section, so as to dilate when the part to be mated of the male element is plugged into it.

Connecting elements for producing hybrid electronic circuits

A method for manufacturing a device comprising a structure with nanowires based on a semiconducting material such as Si and another structure with nanowires based on another semiconducting material such as SiGe, and is notably applied to the manufacturing of transistors.

Manufacturing a microelectronic device comprising silicon and germanium nanowires integrated on a same substrate

Process for producing an integrated circuit stage formed from a dielectric layer (1) covering interconnection lines (5) and connection points (4), which connect the said lines (5) to conductive parts (6) on the opposite side of the dielectric layer (1). The process consists of forming all the dielectric layer (1) during a single step and then successively etching cavities at the locations of the connection points and the interconnection lines by means of two successively positioned masks and then filling the cavities in a single step with conductive material in order to simultaneously form connection points (4) and interconnection lines (5).

Process for etching and depositing integrated circuit interconnections

An a MIS integrated circuit, such as an EPROM memory cell integrated onto a semiconductor substrate comprises (a) memory points which are insulated from one another and have in each case a stack of materials formed from a first insulant in contact with the substrate, first and second gates separated from one another by a second insulant, the first gate being in contact with the first insulant, a source and a drain formed in the substrate on either side of the stack of gates, and a channel, whose length is oriented according to a first direction Y, (b) first metal lines parallel to the first direction for applying electric signals to said stacks and (c) second conductor lines parallel to a second direction X perpendicular to the first direction and produced on the drains for applying electric signals to said drains. A process for making the circuit is also disclosed.

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Crolles, France

Michel Heitzmann