Synopsys, Inc.

Intel Corporation

Micheal D Cranford

John P Stirniman

Michael Lawrence Rieger

Srinivas Chennupaty

Patrice L Roussel

James S Coke

Stavros Kalafatis

Katherine Kong

Brinkley Sprunt

Mohammed A Abdallah

Scott D “Dion” Rodgers

An apparatus and method for performing a shuffle operation on packed data using computer-implemented steps is described. In one embodiment, a first packed data operand having at least two data elements is accessed. A second packed data operand having at least two data elements is accessed. One of the data elements in the first packed data operand is shuffled into a lower destination field of a destination register, and one of the data elements in the second packed data operand is shuffled into an upper destination field of the destination register.

Dual function system and method for shuffling packed data elements

Techniques and systems for converting a non-bandlimited pattern layout into a band-limited pattern image are described. During operation, the system receives the non-bandlimited pattern layout which comprises one or more polygons. The system further receives an anti-aliasing filter (AAF) kernel, wherein the AAF kernel is configured to convert a non-bandlimited pattern into a band-limited pattern. The system then constructs an AAF lookup table for the AAF kernel, wherein the AAF lookup table contains precomputed values for a set of convolution functions which are obtained by convolving a set of basis functions with the AAF kernel. Next, the system creates a sampled pattern layout by applying a grid map over the pattern layout. The system then obtains the band-limited pattern image by using the AAF lookup table to convolve the AAF kernel with each grid location in the sampled pattern layout.

Flash-based anti-aliasing techniques for high-accuracy high-efficiency mask synthesis

An embodiment of the present invention provides a system that computes the effect of perturbations to a pattern layout during an OPC process. During operation, the system receives a pattern layout and a set of lithography model kernels. The system then obtains a set of convolved patterns by convolving the pattern layout with each of the set of lithography model kernels. The system additionally receives a perturbation pattern to be added onto the pattern layout. Next, for a query location on the pattern layout, the system obtains a set of convolution values at the query location by using model flash lookup tables to convolve the perturbation pattern with the set of lithography model kernels. The system then updates the set of convolved patterns at the query location to account for the effect of the perturbation pattern by combining the set of convolution values with the set of convolved patterns.

Flash-based updating techniques for high-accuracy high efficiency mask synthesis

One embodiment of the present invention provides a system that converts a non-bandlimited pattern layout into a band-limited pattern image to facilitate simulating an optical lithography process. During operation, the system receives the non-bandlimited pattern layout which comprises one or more polygons. The system further receives an anti-aliasing filter (AAF) kernel, wherein the AAF kernel is configured to convert a non-bandlimited pattern into a band-limited pattern. The system then constructs an AAF lookup table for the AAF kernel, wherein the AAF lookup table contains precomputed values for a set of convolution functions which are obtained by convolving a set of basis functions with the AAF kernel. Next, the system creates a sampled pattern layout by applying a grid map over the pattern layout. The system then obtains the band-limited pattern image by using the AAF lookup table to convolve the AAF kernel with each grid location in the sampled pattern layout.

Flash-based anti-aliasing techniques for high-accuracy high efficiency mask synthesis

A memory is encoded with a model of sensitivity of a distorted layout generated by simulation of a wafer fabrication process, with respect to a change in an original layout that is input to the simulation. The sensitivity model comprises an expression of convolution of the original layout with spatial functions ('kernels') that are identical to kernels of a process model used in the simulation. A difference between the distorted layout and the original layout is computed, and the difference is divided by a sensitivity value which is obtained directly by evaluating the kemel-based sensitivity model, and the result is used to identify a proximity correction (such as serif size or contour movement) to be made to the original layout. Use of a sensitivity model based on a process model's kernels eliminates a second application of the process model to evaluate sensitivity, thereby to reduce memory and computation requirements.

Model of sensitivity of a simulated layout to a change in original layout, and use of model in proximity correction

A method and apparatus for monitoring the performance characteristics of a multithreaded processor executing instructions from two or more threads simultaneously. Event detectors detect the occurrence of specific processor events during the execution of instructions from threads of a multithreaded processor. Specialized event select control registers are programmed to control the selection, masking and qualifying of events to be monitored. Events are qualified according to their thread ID and thread current privilege level (CPL). Each event that is qualified is counted by one of several programmable event counters that keep track of all processor events being monitored. The contents of the event counters can then be accessed and sampled via a program instruction.

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Hillsboro, OR, United States of America

Micheal D Cranford