Tokyo Electron Limited

Sensys Instruments Corporation

Kla Tencor Corporation

Therma-wave, Inc.

Pfi Acquisition, Inc.

Purfresh, Inc.

Michael Weber

Fred E Stanke

Clinton Carlisle

Edric Tong

Hung The Pham

Elliot Burke

James M Cahill

Douglas E Ruth

Talat Fatima Hasan

William P Kuhn

Amin Samsavar

Robert E Parks

Thomas Harding McWaid

Michael Patrick Shannon

Paul H Dick

Robert Hayes

Timothy P Knight

Howard Wang

Ray Hoobler

David Cope

Thomas Justmann

Steven Saadat

Andrew Volondin

Power adapters for providing power to accessory devices in refrigerated containers are provided herein. The power adapter comprises a first connector communicatively coupled with a plurality of conductors; a second connector communicatively coupled with two or more of the plurality of conductors; and a shunt communicatively coupled with at least four of the plurality of conductors and configured to provide power to an accessory output in response to the accessory connection being communicatively coupled with an accessory device.

Apparatus for powering an accessory device in a refrigerated container

Provided herein are exemplary methods for increasing crop yield. One exemplary method for increasing a yield of a crop includes controlling plant tissue stress by at least partially coating a plant tissue with a composition comprising an agricultural sunscreen formulation and a second agricultural chemical. The agricultural sunscreen formulation and the second agricultural chemical may be applied to the plant tissue from separate containers, wherein each container either contains the agricultural sunscreen formulation or the second agricultural chemical. Further, the agricultural sunscreen formulation and the second agricultural chemical may be applied to the crop at or near the same time. Alternatively, the agricultural sunscreen formulation and the second agricultural chemical may be applied to the crop from a shared container, wherein the shared container contains both the agricultural sunscreen formulation and the second agricultural chemical.

Methods to increase crop yield

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

Apparatus for imaging metrology

This invention is an instrument adaptable for integration into a process tool the combines a number of instruments for surface characterization. As an integrated process monitor, the invention is capable of monitoring surface dishing, surface erosion and thickness of residue layers on work-pieces with little time delay. The invention is adaptable to making measurements while a wafer or work-piece is either wet or dry. A preferred embodiment includes an integrated optical profiler adapted to surface profiling in the presence of optical interference arising from retro-reflections from underlying optical non-uniformities Alternate embodiments include an integrated stylus profiler with vibration isolation.

Integrated surface metrology

This invention is an instrument adaptable for integration into a process tool the combines a number of instruments for surface characterization. As an integrated process monitor, the invention is capable of monitoring surface dishing, surface erosion and thickness of residue layers on work-pieces with little time delay. The invention is adaptable to making measurements while a wafer or work-piece is either wet or dry. A preferred embodiment includes an integrated optical profiler adapted to surface profiling in the presence of optical interference arising from retro-reflections from underlying optical non-uniformities. Alternate embodiments include an integrated stylus profiler with vibration isolation.

Wafer metrology apparatus and method

An optical profilometer and a stylus probe measuring device used in the same instrument have the advantage that these two sensors can be quickly switched between each other. This can be an advantage when used to measure samples, since the optical profilometer can be used until a sample is found to be outside of the desired tolerances. Afterwards, the stylus probe measuring device can be used to accurately determine the profile data. This is an advantage because an optical profilometer is relatively quick, and the stylus probe measuring device is relatively accurate. Additionally, since the optical profilometer and stylus probe device are in the same instrument, the X and Y positions of these devices can be interrelated accurately. This allows images to be produced where the positions on the images can be easily correlated. For example, measurement cursors in sensor data displays can correlated by the positional offset information.

Optical profilometer combined with stylus probe measurement device

Growing community of inventors

Sunnyvale, CA, United States of America

Michael Weber