Eastman Chemical Company

Michael Wayne Quillen

John Cleaon Moore

Edward Enns McEntire

Dale Edward O'Dell

Zachary Philip Lee

Spencer Erich Hochstetler

Richard Dalton Peters

Rodney Scott Armentrout

Darryl W Muck

L Palmer Holbrook

Processes associated apparatus and compositions useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. Processes are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and the organic substances are completely removed by rinsing. The compositions and processes may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.

Processes and compositions for removing substances from substrates

Processess and compositions for removing substances from substrates

Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.

Compositions and methods for removing organic substances

A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC (integrated circuits), liquid crystal displays and flat panel displays. The process includes the use of certain esters or certain esters combined with particular co-solvents. The cleaning method may be utilized in a variety of cleaning processes or process steps and offers economic and performance advantages.

Substrate cleaning processes through the use of solvents and systems

Growing community of inventors

Kingsport, TN, United States of America

Michael Wayne Quillen