Excelitas Noblelight Gmbh

Heraeus Noblelight Gmbh

Michael Tittmann

Larisa Von Riewel

Jürgen Weber

Lotta Gaab

Bernhard Graziel

Vincent Krafft

Holger Zissing

Michael Honig

Jens Büngener

A method for at least partially drying a substrate. The method includes: (a) directing a supply air flow onto the substrate with a direction component in either the transport direction, or the opposite direction and (b) directing an exhaust air flow away from the substrate. The method is reproducible and effective and achieves an improved result with respect to the homogeneity and speed of drying because the exhaust air flow is split into a plurality of sub-flows by supplying each of the sub-flows to an individual intake channel, and because, in the event of a supply air flow in the transport direction of movement of the substrate, the supply air flow is arranged spatially upstream of the exhaust air flow and, in the event of a supply air flow in the opposite direction, the supply air flow is arranged spatially downstream of the exhaust air flow.

Method for drying a substrate and air-drying module and drying system

Methods for drying a substrate. The methods include the following steps: (a) emitting infrared radiation towards a substrate moving through a process space using an emitter unit comprising at least one infrared emitter, (b) generating at least two process gas streams of a process gas directed towards the substrate, (c) drying the substrate by the action of infrared radiation and process gas on the substrate, and (d) extracting moisture-laden process gas from the process space via an extraction duct, forming an exhaust air stream leading away from the substrate. To specify a drying method which is reproducible and effective and leads to an improved result, in particular in terms of homogeneity and speed of drying of the substrate, the at least two process gas streams are guided to the infrared emitter before they act on the substrate, and an exhaust air stream is spatially assigned to each process gas stream.

Method for drying a substrate, dryer module for carrying out the method, and dryer system

Methods for drying a substrate. The methods include the following steps: (a) emitting infrared radiation towards a substrate moving through a process space using an emitter unit comprising at least one inflated emitter, (b) generating at least two process gas streams of a process gas directed towards the substrate, (c) drying the substrate by the action of infrared radiation and process gas on the substrate, and (d) extracting moisture-laden process gas from the process space via an extraction duct, forming an exhaust air stream leading away from the substrate. To specify a drying method which is reproducible and effective and leads to an improved result, in particular in terms of homogeneity and speed of drying of the substrate, the at least two process gas streams are guided to the infrared emitter before they act on the substrate, and an exhaust air stream is spatially assigned to each process gas stream.

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Hanau, Germany

Michael Tittmann